Wafer to wafer overlay control algorithm implementation based on statistics

Byeong Soo Lee; Young Seog Kang; Jeong Heung Kong; Hyun Woo Hwang; Myeong Gyu Song

doi:10.1117/12.2086936

26 March 2015 Wafer to wafer overlay control algorithm implementation based on statistics

Byeong Soo Lee, Young Seog Kang, Jeong Heung Kong, Hyun Woo Hwang, Myeong Gyu Song

Proceedings Volume 9426, Optical Microlithography XXVIII; 942614 (2015) https://doi.org/10.1117/12.2086936
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

For mass production of DRAM device, a stable and effective overlay control becomes more and more important as DRAM design rule shrinks. Existent technologies were already applied to overcome this situation. Nevertheless, we are still suffered from tight overlay margin and forced to move from lot-based to wafer-based overlay control. However, the wafer-based control method requires a huge amount of measurement resource.

In this paper, we present the insight for the wafer-based overlay correction with optimal measurement resource which is suitable for mass production. The experiment which is the wafer-based overlay correction by several statistical analyses carried out for 2X nm node DRAM. Among them, linear regression is a strong candidate for wafer-based overlay control, which improved up to 0.8 nm of maximum overlay.

Citation Download Citation

Byeong Soo Lee, Young Seog Kang, Jeong Heung Kong, Hyun Woo Hwang, and Myeong Gyu Song "Wafer to wafer overlay control algorithm implementation based on statistics", Proc. SPIE 9426, Optical Microlithography XXVIII, 942614 (26 March 2015); https://doi.org/10.1117/12.2086936

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