Atomic layer deposition of Al2O3 on NF3-pre-treated graphene

Marcel Junige; Tim Oddoy; Rositsa Yakimova; Vanya Darakchieva; Christian Wenger; Grzegorz Lupina; Julia Kitzmann; Matthias Albert; Johann W. Bartha

doi:10.1117/12.2181242

1 June 2015 Atomic layer deposition of Al₂O₃ on NF₃-pre-treated graphene

Marcel Junige, Tim Oddoy, Rositsa Yakimova, Vanya Darakchieva, Christian Wenger, Grzegorz Lupina, Julia Kitzmann, Matthias Albert, Johann W. Bartha

Author Affiliations +

Proceedings Volume 9519, Nanotechnology VII; 951915 (2015) https://doi.org/10.1117/12.2181242
Event: SPIE Microtechnologies, 2015, Barcelona, Spain

Abstract

Graphene has been considered for a variety of applications including novel nanoelectronic device concepts. However, the deposition of ultra-thin high-k dielectrics on top of graphene has still been challenging due to graphene's lack of dangling bonds. The formation of large islands and leaky films has been observed resulting from a much delayed growth initiation. In order to address this issue, we tested a pre-treatment with NF₃ instead of XeF₂ on CVD graphene as well as epitaxial graphene monolayers prior to the Atomic Layer Deposition (ALD) of Al₂O₃. All experiments were conducted in vacuo; i. e. the pristine graphene samples were exposed to NF₃ in the same reactor immediately before applying 30 (TMA-H₂O) ALD cycles and the samples were transferred between the ALD reactor and a surface analysis unit under high vacuum conditions. The ALD growth initiation was observed by in-situ real-time Spectroscopic Ellipsometry (irtSE) with a sampling rate above 1 Hz. The total amount of Al₂O₃ material deposited by the applied 30 ALD cycles was cross-checked by in-vacuo X-ray Photoelectron Spectroscopy (XPS). The Al₂O₃ morphology was determined by Atomic Force Microscopy (AFM). The presence of graphene and its defect status was examined by in-vacuo XPS and Raman Spectroscopy before and after the coating procedure, respectively.

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Marcel Junige, Tim Oddoy, Rositsa Yakimova, Vanya Darakchieva, Christian Wenger, Grzegorz Lupina, Julia Kitzmann, Matthias Albert, and Johann W. Bartha "Atomic layer deposition of Al₂O₃ on NF₃-pre-treated graphene", Proc. SPIE 9519, Nanotechnology VII, 951915 (1 June 2015); https://doi.org/10.1117/12.2181242

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