Measuring skew in average surface roughness as a function of surface preparation

Mark T. Stahl

doi:10.1117/12.2187535

27 August 2015 Measuring skew in average surface roughness as a function of surface preparation

Mark T. Stahl

Proceedings Volume 9575, Optical Manufacturing and Testing XI; 95750J (2015) https://doi.org/10.1117/12.2187535
Event: SPIE Optical Engineering + Applications, 2015, San Diego, California, United States

Abstract

Characterizing surface roughness is important for predicting optical performance. Better measurement of surface roughness reduces polishing time, saves money and allows the science requirements to be better defined. This study characterized statistics of average surface roughness as a function of polishing time. Average surface roughness was measured at 81 locations using a Zygo^® white light interferometer at regular intervals during the polishing process. Each data set was fit to a normal and Largest Extreme Value (LEV) distribution; then tested for goodness of fit. We show that the skew in the average data changes as a function of polishing time.

Citation Download Citation

Mark T. Stahl "Measuring skew in average surface roughness as a function of surface preparation", Proc. SPIE 9575, Optical Manufacturing and Testing XI, 95750J (27 August 2015); https://doi.org/10.1117/12.2187535

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