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The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages. AuthorsNumbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Abe, Tsukasa, 13 Ackmann, Paul, 1H, 1V Adelmann, Christoph, 0X Akima, Shinji, 18 Amano, Tsuyoshi, 0Y, 13, 1E Armeanu, Ana-Maria, 0W Asada, Hironori, 1K Auth, N., 1P Badger, Karen D., 0L, 11 Bandoh, Hideaki, 1Z Bartha, Johann W., 15 Bartlau, Peter, 16 Beltman, Jan, 07 Benk, Markus P., 0F, 14 Bivens, Darin, 16 Böcker, Paul, 1S Bonam, Ravi, 0L Bork, Ingo, 0U, 0W Bottiglieri, Gerardo, 03 Broadbent, William, 11 Browning, Clyde, 15 Buck, Peter, 0U, 0W Buergel, Christian, 1H Byun, Jin-Moo, 1S Capelli, Renzo, 1D Cekli, Hakki Ergun, 07 Chakravorty, Kishore, 09 Chandrachood, Madhavi, 16 Chang, Chin Kuei, 1R Chang, Shao-Wen, 08, 0I Chen, Chia-Jen, 08, 0I Chen, Chien-Cheng, 08 Chen, Ellison, 1Q Chen, Jeff, 16 Chen, Norman, 1V Cheng, James, 1R Cheng, Jeffrey, 1R Chishima, Tatsuya, 1L Cho, Sang-Joon, 1A Choi, Chungseon, 1T Choi, Jaehyuck, 0C Choi, Jihwan, 1O Choi, Jun Yeol, 0C Choi, Kang-Hoon, 15 Choi, W., 06 Choi, Woosun, 1U Chomat, Michael, 0W Chou, William, 1R Chun, Kyungwha, 1U Chung, Dong-Hoon, 20 Claus, Rene A., 0F Connolly, Brid, 0G Craig, Peter, 1R Crawford, Shaun, 16 Crell, Christian, 1V Daneshpanah, M., 06 Dattilo, Davide, 0C, 1B Davydova, Natalia, 0Z Deckers, David, 1S de Kruif, Robert, 0Z de Winter, L., 0K Dietze, Uwe, 0C, 1B Dillon, Brian, 0T Du, Yuelin, 22 Durvasula, Bhardwaj, 0U Edinger, K., 1P Farys, Vincent, 0W Faure, Tom, 16 Ferber, M., 06 Fiekowsky, Dan, 1W Fiekowsky, Peter, 1W Figueiro, Thiago, 0T, 15 Finders, J., 0K Fliervoet, Timon, 0Z Fu, Nan, 1H Fujii, Nobuaki, 1X Gallagher, Emily E., 0X Gatefait, Maxime, 07 Glasser, Joshua, 1Q Goldberg, Alexander, 0S Goldberg, Kenneth A., 0F, 14 Goldfarb, Dario L., 0A Goto, So, 1G Graur, Ioana, 0M Grimbergen, Michael, 16 Guo, Daifeng, 22 Guo, Eric, 1M, 1Z Gupta, Rachit, 05 Ha, Taejoong, 1T Halle, Scott, 0L Halls, Mathew D., 0S Ham, Young, 1R Han, Kwangsoo, 0E Han, Sang-Jun, 1S Hara, Daisuke, 1X Harada, Tetsuo, 1E Harashima, Noriyuki, 1L Hashimoto, Hiraku, 1E Hatakeyama, Masahiro, 0B Hayano, Katsuya, 1X Hayashi, Naoya, 1C Hecker, Sandra, 1H Hellweg, Dirk, 1D Hendrickx, Eric, 0Z Hermanns, Ch. F., 1P Hibbs, Michael, 11 Hirano, Ryoichi, 0B, 0Y Hirano, Takashi, 0R Ho, Yen-Cheng, 08 Hohle, Christoph, 15 Hong, Hyeongsun, 1U Hoshino, Ryoichi, 1K Hsu, Jyh-Wei, 1B Hsu, Simon C. C., 1R Huang, Chain Ting, 1R Huang, L. R., 1Q Huang, W. H., 1Q Huguennet, Frederic, 0W Hutchinson, Trent, 11 Huyghebaert, Cedric, 0X Iida nee Sakurai, Noriko, 1C Iida, Susumu, 0Y Imai, Hidemichi, 1W, 1X Inoue, Hiromu, 0R Inuzuka, Hideki, 1W Iso, Hiroyuki, 1L Isogawa, Takeshi, 18 Isomura, Ikunao, 0R Iwamoto, Kazunori, 0P Iwanaga, Takehiko, 0P Iwasa, Junji, 0P Jang, Heeyeon, 1Y Jeon, Chan-Uk, 0C, 0V, 20 Jin, Gyoyoung, 1U Jo, Ahjin, 1A Jo, Sangjin, 1T Jonckheere, Rik, 0X Jung, Hong-Yul, 20 Jung, Hoyong, 1J, 1O Jung, Jinhee, 1U Kagawa, Masayuki, 0N Kageyama, Kagehiro, 1I Kahng, Andrew B., 0E Kaiser, Winfried, 03 Kajiwara, Takenori, 17 Kamo, Takashi, 1C Kanno, Kayoko, 1W Kanno, Koichi, 1X Kato, Masaya, 1W Kawata, Atsushi, 1K Kelkar, Amrish, 1Q Kikuiri, Nobutaka, 0R Kim, Byong, 1A Kim, Byung Gook, 0C Kim, Gwang-Gon, 1S Kim, Hyunjoong, 1U Kim, In-Seon, 1F Kim, Jinsu, 0C Kim, Munsik, 1J Kim, Sangpyo, 06, 1J, 1O, 1T, 1Y Kim, Sukwhan, 1U Kim, Sungjin, 1U Kim, Yongho, 1O Kim, Young-Sik, 1S Kinoshita, Hiroo, 1E Kishimura, Yukiko, 1K Kneer, Bernhard, 03 Koh, Soowan, 0C Kosuge, Takeshi, 1W Kou, Weitian, 1S Kupers, Michiel, 1S Kuribara, Masayuki, 1X Kwak, Noh-Jung, 1S Kwon, E., 06 Laske, F., 06 Last, T., 0K Lawliss, Mark, 0L, 18 Lee, Adder, 1R Lee, Dongwook, 1O Lee, Hong-Goo, 1S Lee, Hsin-Chang, 08, 0I Lee, Hyein, 0E Lee, Hyemi, 1J Lee, Inja, 1U Lee, Jae Uk, 0X Lee, Jooyoung, 1U Lee, Ju Suk, 1A Lee, Keibock, 1A Lee, Kweonjae, 1U Lee, Sukho, 0V, 1G Lee, Youngmo, 06, 1T, 1Y Leung, Toi, 16 Levinson, Harry J., 02 Li, Rivan, 1M Liang, Ted, 09 Lien, Ta-Cheng, 08, 0I Lim, Young-Wan, 1S Lin, C. J., 1Q Lin, Chih-Cheng, 08, 0I Litt, Lloyd C., 1V Liu, Tzu-Ling, 08 Liubich, Vlad, 05 Lowe, Jeff, 0C Lu, Colbert, 1R Lu, Max, 1M, 1Z Luchs, T., 1P Ma, Won-Kwang, 1S Magana, John, 09 Magnusson, Krister, 1D Malloy, Matt, 1D Mangat, Pawitter, 14 Matsumoto, Jun, 1X Matsushita, Shohei, 1X McMurran, Jeff, 1R McNamara, Elliott, 1S Migura, Sascha, 03 Miyashita, Hiroyuki, 1W, 1X Miyazaki, Junji, 0Z, 10 Mo, Soo-Yeon, 1F Mochizuki, Satoru, 1l Morikawa, Yasutaka, 1C Murakawa, Tsutomu, 1X Nagaoka, Yoshinori, 10 Nakamura, Takayuki, 1X Narita, Eisuke, 0L, 0N Naulleau, Patrick P., 0D, 0F Neumann, Jens Timo, 03, 0Z Neureuther, Andrew R., 0D, 0F, 0G Ning, Guoxiang, 1H, 1V Nozawa, Osamu, 17 Ogawa, Riki, 0R Oh, Hye-Keun, 1F Oh, Sunghyun, 1T Pang, Linyong, 1X Paninjath, Sankaranarayanan, 20 Panning, Eric, 09 Park, Jisoong, 0V, 1G Park, Sang-il, 1A Pastol, Anne, 07 Peng, N. T., 1R Pereira, Mark, 20 Perlitz, Sascha, 1D Peters, Jan Hendrik, 1D Petroni, Paolo, 0T Philipp, Peter, 1V Philipsen, Vicky, 0Z Pollentier, Ivan, 0X Pollock, Chuck, 1R Progler, Chris, 0T Qi, Zhengqing John, 0L, 0N, 18 Raghunathan, Ananthan, 0M Rankin, Jed, 0L, 0M, 0N, 18 Redding, Vincent, 11 Reddy, Murali, 0U Ren, Catherine, 1M Roeth, K. D., 06 Roling, Stefan, 1H Ryan, Kevin, 1S Saib, Mohamed, 0T, 15 Sakamoto, Yoshifumi, 16 Samir, Bhamidipati, 20 Schanen, Isabelle, 0W Schiavone, Patrick, 0T, 15 Schneider, H., 1P Sczyrba, Martin, 0G Seidel, Thomas E., 0S Seki, Kazunori, 0L, 11, 18 Shang, Shumay, 05 Shanker, Aamod, 0G Shi, Irene, 1M Shida, Soichi, 1X Shin, Inkyun, 0V Shin, So-Eun, 0V, 1G Shin, Sukho, 1U Shishido, Hiroaki, 17 Shoki, Tsutomu, 0C Shon, Jungwook, 0V, 1G Spies, P., 1P Sreenivasan, S. V., 0P Stobert, Ian, 0M Sturtevant, John, 05 Suh, Jung-Joon, 1S Sun, Kyu-Tae, 1S Sundermann, Frank, 07, 0W Takagi, Noriaki, 13 Takahashi, Nobuyasu, 1G Takai, Kosuke, 1C Takayama, Tomohiro, 1K Terao, Kenji, 0B Thrun, Xaver, 15 Tian, Haitong, 22 Tian, Mingjing, 1M, 1Z Tran, Jeffrey, 16 Troost, Kars, 03 Tseng, Alex C. P., 1R Tseng, Y. N., 1Q Tsuchiya, Hideo, 0R Tsunoda, Dai, 1G Tuo, Laurent C., 1Q Turley, Christina, 0L Uchida, Shigeru, 1I Vacca, Anthony, 1W van Haren, Richard, 07 van Ingen Schenau, Koen, 03 Van Look, Lieve, 0Z van Oosten, Anton, 0Z Vanpaemel, Johannes, 0X van Schoot, Jan, 03, 0Z Vengertsev, Dmitry, 0M Verduijn, Erik, 14 Waiblinger, M., 1P Waller, Laura, 0G Wang, Elvik, 1Q Wang, Jianwei, 1Z Wang, Lutong, 0E Wang, Tzu-Yi, 0I Wang, Yow-Gwo, 0D, 0F Watanabe, Hidehiro, 0B, 0Y Watanabe, Takeo, 1E Weiss, Markus, 1D Wen, Vincent, 1Q Werle, Florian, 1H Wistrom, Richard, 16 Wittebrood, Friso, 0Z Wojdyla, Antoine, 0F, 14 Wolff, K., 1P Wong, Martin D. F., 22 Woo, Sungha, 1Y Wood, Obert R., III, 14 Word, James, 05 Wu, David, 1Q Wu, J. K., 1R Wurm, Stefan, 1D Wylie, Mark, 1Q Yalamanchili, Rao, 16 Yamakawa, Hiroyuki, 1I Yan, Bojan, 1M Yen, Anthony, 08, 0I Yesilada, Emek, 0W Yim, Donggyu, 06, 1J, 1O, 1T, 1Y Yim, Jongsuk, 1U Yoo, Young-kook, 1A Yoon, Gi-Sung, 20 Yoshikawa, Ryoji, 0R Yoshikawa, Shingo, 1W, 1X Yu, Chun Chi, 1R Yu, Julia, 1R Yu, Keven, 16 Zahedmanesh, Houman, 0X Zandiatashbar, Ardavan, 1A Zhang, Guojing, 09 Zimmerman, John, 03 Zine El Abidine, Nacer, 0W
Conference CommitteeSymposium Chair Symposium Co-chair Conference Chair Conference Co-chair BACUS Steering Committee Frank Abboud, Intel Corporation (United States) Paul Ackmann, GLOBALFOUNDRIES Inc. (United States) Paul C. Allen, Toppan Photomasks, Inc. (United States) Michael D. Archuletta, RAVE LLC (United States) Artur P. Balasinski, Cypress Semiconductor Corporation (United States) Uwe F. W. Behringer, UBC Microelectronics (Germany) Peter D. Buck, Mentor Graphics Corporation (United States) Byungcheol Cha, SAMSUNG Electronics Company, Ltd. (Korea, Republic of) Thomas B. Faure, GLOBALFOUNDRIES Inc. (United States) Brian J. Grenon, RAVE LLC (United States) Jon Haines, Micron Technology, Inc. (United States) Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan) Mark Jee, HOYA Corporation USA (United States) Bryan S. Kasprowicz, Photronics, Inc. (United States) Patrick M. Martin, Applied Materials, Inc. (United States) M. Warren Montgomery, College of Nanoscale Sciences and Engineering (CNSE) (United States) Wilbert Odisho, KLA-Tencor Corporation (United States) Michael T. Postek, National Institute of Standards and Technology (United States) Abbas Rastegar, SEMATECH Inc. (United States) Douglas J. Resnick, Molecular Imprints, Inc. (United States) Thomas Struck, Infineon Technologies AG (Germany) Bala Thumma, Synopsys, Inc. (United States) Jacek K. Tyminski, Nikon Research Corporation of America (United States) Michael Watt, Shin-Etsu MicroSi, Inc. (United States) Jim N. Wiley, ASML US, Inc. (United States) Larry S. Zurbrick, Keysight Technologies, Inc. (United States)
Conference Program Committee Frank E. Abboud, Intel Corporation (United States) Paul W. Ackmann, GLOBALFOUNDRIES Inc. (United States) Lucien Bouchard, Photronics, Inc. (United States) Ron R. Bozak, RAVE LLC (United States) Russell B. Cinque, JEOL USA Inc. (United States) Uwe Dietze, SUSS MicroTec Inc. (United States) Aki Fujimura, D2S, Inc. (United States) Emily E. Gallagher, IMEC (United States) Rik Jonckheere, IMEC (Belgium) Byung Gook Kim, SAMSUNG Electronics Company, Ltd. (Korea, Republic of) Shy-Jay Lin, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan) Pawitter J. Mangat, GLOBALFOUNDRIES Inc. (United States) M. Warren Montgomery, SUNY College of Nanoscale Science and Engineering (United States) Linyong Pang, D2S, Inc. (United States) Kenichi Saito, NuFlare Technology, Inc. (Japan) Thomas Scherübl, Carl Zeiss SMT GmbH (Germany) Steffen F. Schulze, Mentor Graphics Corporation (United States) Anna Tchikoulaeva, Lasertec U.S.A., Inc. Zweigniederlassung Deutschland (Germany) Banqiu Wu, Applied Materials, Inc. (United States) Stefan Wurm, SEMATECH Inc. (United States) Mark M. Wylie, KLA-Tencor Idaho (United States)
Session Chairs 1 Keynote Session Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan) Bryan S. Kasprowicz, Photronics, Inc. (United States) 2 Invited Session: Joint with Photomask and Scanning Microscopies Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan) Bryan S. Kasprowicz, Photronics, Inc. (United States) Michael T. Postek, National Institute of Standards and Technology (United States) 3 Edge Placement Error Issue and Solution for Multi-Patterning Peter D. Buck, Mentor Graphics Corporation (United States) Aki Fujimura, D2S, Inc. (United States) 4 EUV Mask Infrastructure Readiness Emily E. Gallagher, IMEC (Belgium) Thomas B. Faure, GLOBALFOUNDRIES Inc. (United States) 5 Student Session Bryan S. Kasprowicz, Photronics, Inc. (United States) Jim N. Wiley, ASML US, Inc. (United States) Thomas Scheruebl, Carl Zeiss SMT GmbH (Germany) 6 Scanning Beam Technologies and Applications: Joint Session with Photomask and Scanning Microscopies Michael T. Postek, National Institute of Standards and Technology (United States) Jan Hendrik Peters, Carl Zeiss SMS GmbH (Germany) 7 EUV Simulation Paul C. Allen, Toppan Photomasks, Inc. (United States) Banqiu Wu, Applied Materials, Inc. (United States) 8 Photomask Technology for Alternative Lithography: NIL Douglas J. Resnick, Canon Nanotechnologies, Inc. (United States) Uwe Dietze, SUSS MicroTec Inc. (United States) 9 Mask Data Preparation and Mask Process Correction Bala Thumma, Synopsys, Inc. (United States) Linyong Pang, D2S, Inc. (United States) 10 Invited and Best Papers Uwe F. W. Behringer, UBC Microelectronics (Germany) Brian J. Grenon, Grenon Consulting, Inc. (United States) 11 Metrology and Inspection Mark M. Wylie, KLA-Tencor Idaho (United States) Jerry Cullins, HOYA Corporation (Japan) 12 Patterning and Process Kenichi Saito, NuFlare Technology, Inc. (Japan) Russell B. Cinque, JEOL USA Inc. (United States)
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