An integrated source/mask/DSA optimization approach

Tim Fühner; Przemysław Michalak; Ulrich Welling; Juan Carlos Orozco-Rey; Marcus Müller; Andreas Erdmann

doi:10.1117/12.2222170

23 March 2016 An integrated source/mask/DSA optimization approach

Tim Fühner, Przemysław Michalak, Ulrich Welling, Juan Carlos Orozco-Rey, Marcus Müller, Andreas Erdmann

Proceedings Volume 9780, Optical Microlithography XXIX; 97800M (2016) https://doi.org/10.1117/12.2222170
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The introduction of DSA for lithography is still obstructed by a number of technical issues including the lack of a comprehensive computational platform. This work presents a direct source/mask/DSA optimization (SMDSAO) method, which incorporates standard lithographic metrics and figures of merit such as the maximization of process windows. The procedure is demonstrated for a contact doubling example, assuming grapho-epitaxy-DSA. To retain a feasible runtime, a geometry-based Interface Hamiltonian DSA model is employed. The feasibility of this approach is demonstrated through several results and their comparison with more rigorous DSA models.

Citation Download Citation

Tim Fühner, Przemysław Michalak, Ulrich Welling, Juan Carlos Orozco-Rey, Marcus Müller, and Andreas Erdmann "An integrated source/mask/DSA optimization approach", Proc. SPIE 9780, Optical Microlithography XXIX, 97800M (23 March 2016); https://doi.org/10.1117/12.2222170

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