Methodology for analyzing and quantifying design style changes and complexity using topological patterns

Jason P. Cain; Ya-Chieh Lai; Frank Gennari; Jason Sweis

doi:10.1117/12.2220021

16 March 2016 Methodology for analyzing and quantifying design style changes and complexity using topological patterns

Jason P. Cain, Ya-Chieh Lai, Frank Gennari, Jason Sweis

Proceedings Volume 9781, Design-Process-Technology Co-optimization for Manufacturability X; 978108 (2016) https://doi.org/10.1117/12.2220021
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In order to maximize yield, IC design companies spend a lot of effort to analyze what types of design styles are needed and used in their layouts (standard cells, macros, routing layers, and so forth). This paper introduces a novel methodology for full chip high performance topological pattern analysis and the applications of this methodology towards analyzing design styles in order to quantify and measure design changes and the degree of layout regularization. This new approach allows engineers to perform a full profiling across all patterns that exist in design and without needing to explicitly specify what patterns to analyze.

Citation Download Citation

Jason P. Cain, Ya-Chieh Lai, Frank Gennari, and Jason Sweis "Methodology for analyzing and quantifying design style changes and complexity using topological patterns", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978108 (16 March 2016); https://doi.org/10.1117/12.2220021

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