Optimum Design Method Of Multilayer Elements

Masaki Yamamoto; Shigeru Nakayama; Takeshi Namioka

doi:10.1117/12.948783

16 December 1988 Optimum Design Method Of Multilayer Elements

Masaki Yamamoto, Shigeru Nakayama, Takeshi Namioka

Proceedings Volume 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers; (1988) https://doi.org/10.1117/12.948783
Event: 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1988, San Diego, CA, United States

Abstract

A new design method for soft X-ray multilayers is presented. The method utilizes a recurrence formula for the complex amplitude reflectance of a multilayer and its graphical representation in the Gaussian plane. The design procedure gives a clear insight into the evolution of the complex amplitude reflectance of a multilayer at every stage of the deposition as the multilayer builds up. The thickness of each layer is optimized layer by layer so as to attain the highest possible reflectance for a given set of coating materials with the minimum number of layers. Some examples are given to demonstrate the usefulness of the present method in the design of multilayer elements for soft X-rays.

Citation Download Citation

Masaki Yamamoto, Shigeru Nakayama, and Takeshi Namioka "Optimum Design Method Of Multilayer Elements", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); https://doi.org/10.1117/12.948783

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