Two-micrometer-wavelength laser-produced tin plasma EUV sources

Lars Behnke; Yahia Mostafa; Zoi Bouza; Adam Lassise; Lucas Poirier; John Sheil; Wim Ubachs; Oscar Versolato

doi:10.1117/12.2642234

11 November 2022 Two-micrometer-wavelength laser-produced tin plasma EUV sources

Lars Behnke, Yahia Mostafa, Zoi Bouza, Adam Lassise, Lucas Poirier, John Sheil, Wim Ubachs, Oscar Versolato

Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920D (2022) https://doi.org/10.1117/12.2642234
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Extreme ultraviolet (EUV) light generated by tin-plasma is used for state-of-the-art nanolithography. Currently, the plasma is generated by irradiating tin-microdroplets with 10-micometer wavelength light from CO2-gas lasers. Energy efficient solid-state lasers providing 2-micron wavelength main-pulses may present a viable option for driving EUV-emitting plasma. The 2-micron drive wavelength is situated between the well-studied cases of 1- and 10-micron. Our experiments, using pre-pulse deformed tin droplet targets, show that a 2-micron main-pulse has the potential to provide a higher-brightness source, compared to the 10-micron laser case, with a higher conversion efficiency than in the 1-micron laser case.

Conference Presentation

Citation Download Citation

Lars Behnke, Yahia Mostafa, Zoi Bouza, Adam Lassise, Lucas Poirier, John Sheil, Wim Ubachs, and Oscar Versolato "Two-micrometer-wavelength laser-produced tin plasma EUV sources", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920D (11 November 2022); https://doi.org/10.1117/12.2642234

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