Poster
31 October 2022 Stitching for High NA: new insights and path forward
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Conference Poster
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Natalia V. Davydova, Vincent Wiaux, Joost Bekaert, Frank J. Timmermans, Bram Slachter, Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Hoon Ser, Diederik de Bruin, Stephen D. Hsu, and Rene Carpaij "Stitching for High NA: new insights and path forward", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC1229210 (31 October 2022); https://doi.org/10.1117/12.2653388
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KEYWORDS
Tantalum

Image resolution

Control systems

Extreme ultraviolet lithography

Manufacturing

Optical proximity correction

Reflectivity

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