CONFERENCE PROCEEDINGS
Advanced Search
Home > Journals > J. Micro/Nanolith. MEMS MOEMS > Volume 14 > Issue 4 > Article
Open Access
21 December 2015 Enhanced lithographic resolution using longitudinal polarization state of light
My-Phung Van, Katsiaryna Ushakova, Cees W. M. Bastiaansen, Silvania F. Pereira, H. Paul Urbach, Dirk J. Broer
Author Affiliations +
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 4, 043509 (December 2015). https://doi.org/10.1117/1.JMM.14.4.043509
Abstract
Laser direct-writing is an important technique for the fabrication of complex patterns. There is a continuous need for structures with increasingly small features, i.e., enhanced resolution. Focused radially polarized light is known to exhibit a narrow longitudinal polarization component. Here, a proof-of-concept is shown of enhanced resolution through polarization-selectivity by the selective recording of the longitudinal polarization component in a polarization-selective homeotropic and smectic B photoresist. The full-width-at-half-maximum (FWHM) of the fabricated spots in the polarization-selective resist is up to 56% smaller compared to the FWHM of the same spot in a photoresist that is not polarization-selective, which supports simulations that predict a theoretical maximum reduction of 62%.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Citation Download Citation
My-Phung Van, Katsiaryna Ushakova, Cees W. M. Bastiaansen, Silvania F. Pereira, H. Paul Urbach, and Dirk J. Broer "Enhanced lithographic resolution using longitudinal polarization state of light," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(4), 043509 (21 December 2015). https://doi.org/10.1117/1.JMM.14.4.043509
Published: 21 December 2015
JOURNAL ARTICLE
 6 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
KEYWORDS
Photoresist materials
Polarization
Resolution enhancement technologies
Lithography
Liquid crystals
Atomic force microscopy
Beam splitters
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top