Modeling and optimization of debris mitigation systems for laser and discharge-produced plasma in extreme ultraviolet lithography devices

Valeryi A. Sizyuk; Ahmed Hassanein; Vivek Bakshi

doi:10.1117/1.2804128

1 October 2007 Modeling and optimization of debris mitigation systems for laser and discharge-produced plasma in extreme ultraviolet lithography devices

Valeryi A. Sizyuk, Ahmed Hassanein, Vivek Bakshi

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 6, Issue 4, 043003 (October 2007). https://doi.org/10.1117/1.2804128

Abstract

Physical models are developed to investigate the following conditions relevant to discharge-produced plasma (DPP) devices under development for extreme ultraviolet (EUV) lithography: gaseous jet propagation in the chamber, removal of neutral particles with a gaseous jet, and deviation of charged particles with a magnetic field. Several geometries of the mitigation systems are considered for removing debris during the EUV lithographic process. The design of a mitigation system is proposed and simulated with the computer models. The behavior of Xe, Li, and Sn debris in Ar and He jets is simulated by using the high energy interaction with general heterogeneous target systems (HEIGHTS) integrated package. Final energy and local distributions are calculated using experimental debris data from current EUV facilities.

©(2007) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Valeryi A. Sizyuk, Ahmed Hassanein, and Vivek Bakshi "Modeling and optimization of debris mitigation systems for laser and discharge-produced plasma in extreme ultraviolet lithography devices," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(4), 043003 (1 October 2007). https://doi.org/10.1117/1.2804128

Published: 1 October 2007

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