Volume 23 Issue 4 | Journal of Micro/Nanopatterning, Materials, and Metrology

Journal of Micro/Nanopatterning, Materials, and Metrology

VOL. 23 · NO. 4 | October 2024

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SPIE publishes accepted journal articles as soon as they are approved for publication. Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.

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Special Section on Metrology for EUV (2)

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Special Section on Metrology for EUV

Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank

Tao Shen, Iacopo Mochi, Dongmin Jeong, Elisabeth Mueller, Paolo Ansuinelli, Jinho Ahn, Yasin Ekinci

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 04, 041402, (July 2024) https://doi.org/10.1117/1.JMM.23.4.041402

TOPICS: Reflectivity, Extreme ultraviolet, Ruthenium, Silicon, Light sources and illumination, Reflectometry, Refractive index, Scanning transmission electron microscopy, Grazing incidence, Statistical modeling

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Study of electron-induced chemical transformations in polymers

Maximillian Mueller, Terry McAfee, Patrick Naulleau, Dahyun Oh, Oleg Kostko

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 04, 041403, (July 2024) https://doi.org/10.1117/1.JMM.23.4.041403

TOPICS: Electrons, Outgassing, Polymethylmethacrylate, Polymers, Film thickness, Chemistry, FT-IR spectroscopy, Semiconducting wafers, Vacuum chambers, Extreme ultraviolet lithography

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