The Journal of Micro/Nanopatterning, Materials, and Metrology would like to sincerely thank the following individuals who served as reviewers in 2023. The success of our publication hinges on the voluntary contributions of time and energy put forth by these professionals.
Valery Axelrad
Artur Balasinski
Ajay Baranwal
Gerardo Bottiglieri
Alan Brodie
Peter Brooker
Timothy Brunner
Martin Burkhardt
Luigi Capodieci
Steven Carson
Tom Cecil
Aron Cepler
Norman Chen
Xiuguo Chen
Jin Choi
Jason Chou
Joao Cunha
Guido De Boer
Anuja De Silva
Arie Den Boef
Greg Denbeaux
Vishal Desai
Alain Diebold
Scott Doyle
Zhang Du
Yichen Duan
Mircea Dusa
Andreas Erdmann
Peter Evanschitzky
Jo Finders
Joern-Holger Franke
Andreas Frommhold
Aki Fujimura
Reinhard Galler
Thomas Germer
Andrew Gibson
Eric Goerlitzer
Douglas Guerrero
Scott Halle
Ahmed Hamed
Carsten Hartig
John Hartley
Naoya Hayashi
Christoph Hohle
Fabian Holzmeier
Osamu Inoue
Soichi Inoue
Kenneth Jantzen
Yansha Jin
Keita Kato
Ryoung-han Kim
R. Kline
Tero Kumpulainen
Catherine Labelle
Jared Lai
Romain Lallement
Corey Lemley
Harry Levinson
Ted Liang
Marianne Liebi
Dmitriy Likhachev
Hans Loeschner
Kevin Lucas
Yuansheng Ma
Chris Mack
Sridhar Mahendrakar
Antonio Mani
Mark Maslow
Ken-Ichiro Mori
Gangadhara Raja Muthinti
Seiji Nagahara
Vineet Nair
Sang Ki Nam
Amrit Narasimhan
Takeyoshi Ohashi
Soichi Owa
Giancarlo Pedrini
Danping Peng
Vicky Philipsen
Thomas Pistor
Moshe Preil
Chenhui Qu
Yvon Renotte
Stephen Renwick
Alexander Ribbe
Mohamed Saib
Glen Scheid
Uwe Schroeder
Rajiv Sejpal
Abhishek Shendre
Xuelong Shi
Youngsoo Shin
Sameet Shriyan
Ashwanth Subramanium
Daniel Sunday
Zhengquan Tan
Hiroyoshi Tanabe
Vikram Tolani
Alexander Tritchkov
Sagar Trivedi
Kuen-Yu Tsai
Alessandro Vaglio Pret
Claire Van Lare
James Vickers
John Villarrubia
Saif Wakeel
Cheng Wang
Takeo Watanabe
Francois Weisbuch
Stephan Wieder
Donald Windover
Alfred Wong
Huolin Xin
Shuangning Xu
Yuichiro Yamazaki
Kenji Yamazoe
Shuji Ye
Gang Zhang
Jiong Zhang
Linlin Zhong