Abstract

JM3 thanks the reviewers who served the journal in 2023.

The Journal of Micro/Nanopatterning, Materials, and Metrology would like to sincerely thank the following individuals who served as reviewers in 2023. The success of our publication hinges on the voluntary contributions of time and energy put forth by these professionals.

  • Valery Axelrad

  • Artur Balasinski

  • Ajay Baranwal

  • Gerardo Bottiglieri

  • Alan Brodie

  • Peter Brooker

  • Timothy Brunner

  • Martin Burkhardt

  • Luigi Capodieci

  • Steven Carson

  • Tom Cecil

  • Aron Cepler

  • Norman Chen

  • Xiuguo Chen

  • Jin Choi

  • Jason Chou

  • Joao Cunha

  • Guido De Boer

  • Anuja De Silva

  • Arie Den Boef

  • Greg Denbeaux

  • Vishal Desai

  • Alain Diebold

  • Scott Doyle

  • Zhang Du

  • Yichen Duan

  • Mircea Dusa

  • Andreas Erdmann

  • Peter Evanschitzky

  • Jo Finders

  • Joern-Holger Franke

  • Andreas Frommhold

  • Aki Fujimura

  • Reinhard Galler

  • Thomas Germer

  • Andrew Gibson

  • Eric Goerlitzer

  • Douglas Guerrero

  • Scott Halle

  • Ahmed Hamed

  • Carsten Hartig

  • John Hartley

  • Naoya Hayashi

  • Christoph Hohle

  • Fabian Holzmeier

  • Osamu Inoue

  • Soichi Inoue

  • Kenneth Jantzen

  • Yansha Jin

  • Keita Kato

  • Ryoung-han Kim

  • R. Kline

  • Tero Kumpulainen

  • Catherine Labelle

  • Jared Lai

  • Romain Lallement

  • Corey Lemley

  • Harry Levinson

  • Ted Liang

  • Marianne Liebi

  • Dmitriy Likhachev

  • Hans Loeschner

  • Kevin Lucas

  • Yuansheng Ma

  • Chris Mack

  • Sridhar Mahendrakar

  • Antonio Mani

  • Mark Maslow

  • Ken-Ichiro Mori

  • Gangadhara Raja Muthinti

  • Seiji Nagahara

  • Vineet Nair

  • Sang Ki Nam

  • Amrit Narasimhan

  • Takeyoshi Ohashi

  • Soichi Owa

  • Giancarlo Pedrini

  • Danping Peng

  • Vicky Philipsen

  • Thomas Pistor

  • Moshe Preil

  • Chenhui Qu

  • Yvon Renotte

  • Stephen Renwick

  • Alexander Ribbe

  • Mohamed Saib

  • Glen Scheid

  • Uwe Schroeder

  • Rajiv Sejpal

  • Abhishek Shendre

  • Xuelong Shi

  • Youngsoo Shin

  • Sameet Shriyan

  • Ashwanth Subramanium

  • Daniel Sunday

  • Zhengquan Tan

  • Hiroyoshi Tanabe

  • Vikram Tolani

  • Alexander Tritchkov

  • Sagar Trivedi

  • Kuen-Yu Tsai

  • Alessandro Vaglio Pret

  • Claire Van Lare

  • James Vickers

  • John Villarrubia

  • Saif Wakeel

  • Cheng Wang

  • Takeo Watanabe

  • Francois Weisbuch

  • Stephan Wieder

  • Donald Windover

  • Alfred Wong

  • Huolin Xin

  • Shuangning Xu

  • Yuichiro Yamazaki

  • Kenji Yamazoe

  • Shuji Ye

  • Gang Zhang

  • Jiong Zhang

  • Linlin Zhong

© 2024 Society of Photo-Optical Instrumentation Engineers (SPIE)
"2023 List of Reviewers," Journal of Micro/Nanopatterning, Materials, and Metrology 23(1), 010102 (19 January 2024). https://doi.org/10.1117/1.JMM.23.1.010102
Published: 19 January 2024
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KEYWORDS
Metrology

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