Large surface profile measurement with instantaneous phase-shifting interferometry

N. R. Sivakumar; W. K. Hui; Krishnan Venkatakrishnan; B. K. A. Ngoi

doi:10.1117/1.1532331

1 February 2003 Large surface profile measurement with instantaneous phase-shifting interferometry

N. R. Sivakumar, W. K. Hui, Krishnan Venkatakrishnan, B. K. A. Ngoi

Optical Engineering, Vol. 42, Issue 2, (February 2003). https://doi.org/10.1117/1.1532331

Surface profile measurement of smooth surfaces is a vital area in many of today's industries, especially in wafer fabrication. The increased need for high-speed, noncontact online measurement with high accuracy and repeatability is of great interest for practical purposes. In this work, a modification of Michelson interferometers in combination with instantaneous phase-shifting interferometry is proposed for high-speed large flat-surface profiling. Experiments are carried out on a patterned wafer surface. The results obtained using this system are compared with a commercial profiler system to demonstrate the validity of the principle.

©(2003) Society of Photo-Optical Instrumentation Engineers (SPIE)

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N. R. Sivakumar, W. K. Hui, Krishnan Venkatakrishnan, and B. K. A. Ngoi "Large surface profile measurement with instantaneous phase-shifting interferometry," Optical Engineering 42(2), (1 February 2003). https://doi.org/10.1117/1.1532331

Published: 1 February 2003

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