Deterministic finishing methods of optical components for high-peak-power laser applications that can meet the requirements for high laser damage resistance are not sufficiently developed to meet all needs. This is especially in the case for ultraviolet (UV) laser applications. Fused silica is the material of choice for optics operating at UV wavelengths owing to its intrinsically large bandgap, high transparency, and excellent uniformity. Here, we report on the laser damage behavior of fused silica surfaces finished by fluid jet polishing (FJP) as a function of removal depth. Fused silica test substrates were processed by FJP to depths ranging from 0.7 to 18  μm. Laser damage testing was conducted on these surfaces at 351 nm and 1-ns pulse lengths for both, 1-on-1 and R-on-1 testing protocols. The results for 1-on-1 testing showed no degradation in the laser-induced damage threshold (LIDT) of the substrates. Instead, a gradual improvement starting at a depth of 2.1  μm was observed and continued to the 18  μm surface. At 18  μm of removal, the LIDT was 16% higher than a surface that was not finished by FJP. For R-on-1 testing, all surfaces treated by FJP demonstrated an improvement in laser damage resistance. At depths greater than 5  μm, the improvements were significantly more pronounced and a 30% increase in the LIDT was realized.