CONFERENCE PROCEEDINGS
Advanced Search
Adolph Hunter
VPCorporate Marketing at Cadence Design Systems Inc
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 26 June 2003 Paper
Advanced process control applied to 90-nm node lithography and etch
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.484987
KEYWORDS: Etching, Critical dimension metrology, Semiconducting wafers, Lithography, Process control, Optical lithography, Metrology, Cadmium, Stars, Silicon
Proceedings Article | 26 July 1999 Paper
0.7-NA DUV step-and-scan system for 150-nm imaging with improved overlay
Jan van Schoot, Frank Bornebroek, Manfred Suddendorf, Melchior Mulder, Jeroen van der Spek, Jan Stoeten, Adolph Hunter, Peter Ruemmer
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354357
KEYWORDS: Semiconducting wafers, Optical alignment, Imaging systems, Distortion, Deep ultraviolet, Reticles, Monochromatic aberrations, Photoresist materials, Diffraction, Scanning electron microscopy
Conference Committee Involvement (2)
Data Analysis and Modeling for Process Control
26 February 2004 | Santa Clara, California, United States
Advanced Process Control and Automation
27 February 2003 | Santa Clara, CA, United States
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top