Definitions of centerline and centerline overlay (O/L) are built on the implicit assumptions of certain symmetries. Verification of these symmetries, and the use of redundancies built into the design of O/L measurement marks, can estimate the relative accuracy of O/L measurements, even in the absence of certified reference materials (standards). Verification carried out as of paired comparison is shown to be very effective; in addition, it constitutes the basis for data culling. Several sources of O/L measurement inaccuracy, associated with O/L measurement tools and with O/L measurement marks, are pointed out and some are illustrated using modeling. A simple measure of tool-related inaccuracy, tool-induced shift (TIS), is proposed and utilized as a performance estimate of O/L measurement tools relative to accuracy. Inaccuracies of O/L measurements, caused by O/L measurement tools and marks, on the order of 100 nm, are observed and their causes identified. Examples are given of significant improvements in accuracy. A roadmap toward accurate O/L measurement is outlined. This approach is also applicable to alignment systems.
Results of recent Investigations uncovering significant
errors in overlay (O/L) measurements are reported. The two major
contributors are related to the failures of symmetry of the
overlay measurement tool and of the mark. These may result In
measurement errors on the order of 100 nm. Methodology based on
the conscientious verification of assumptions of symmetry is
shown to be effective in identifying the extent and sources of
such errors. This methodology can be used to arrive at an
estimate of the relative accuracy of the O/L measurements, even
in absence of certified O/L reference materials. Routes to
improve the accuracy of O/L measurements are outlined and some
examples of improvements are given.
Errors in O/L measurements associated with the asymmetry of
the metrology tool can be observed by comparing the O/L
measurements taken at 0 and 180 degree orientations of the sample
in reference to the tool. Half the difference of these
measurements serves as an estimate of such tool related bias in
estimating O/L. This is called tool induced shift (TIS). Errors
of this kind can be traced to asymmetries of tool components, e.
g., camera, illumination misalignment, residual asymmetric
aberrations etc. Tool asymmetry leads to biased O/L estimates
even on symmetric O/L measurement marks. Its impact on TIS
depends on the optical properties of the structure being
measured, the measurement procedure and on the combination of
tool and sample asymmetries. It is also a function of design and
manufacture of the O/L metrology tool. In the absence of
certified O/L samples, measurement accuracy and repeatability may
be improved by demanding that TIS be small for all tools on all
structures.
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