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Alexis Royer
at CEA-LETI
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 25 May 2022 Poster + Paper
Continuous improvement of defectivity rate and CD uniformity in immersion lithography via track co-optimization method
Jorge Nacenta Mendivil, Nathalie Frolet, Karine Jullian, Michael May, Yuji Tanaka, Alexis Royer, Masahiko Harumoto, Raluca Tiron
Proceedings Volume 12055, 120550U (2022) https://doi.org/10.1117/12.2614237
KEYWORDS: Semiconducting wafers, System on a chip, Scanning electron microscopy, Critical dimension metrology, Inspection
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