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Arimichi Okumura
at Daicel Corp
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Publications (1)
Proceedings Article | 31 March 2010 Paper
Novel molecular glass photoresist materials for next-generation lithography
Arimichi Okumura, Yoshinori Funaki, Akira Takaragi, Kazuki Okamoto, Kiyoharu Tsutsumi, Keizo Inoue, Ryou Itaya, Kiyoshi Ikura, Yuki Iguchi
Proceedings Volume 7639, 76392E (2010) https://doi.org/10.1117/12.846501
KEYWORDS: Lithography, Line width roughness, Glasses, Polymers, Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon
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