Mr. Ashley J. Aldrin Profile

Ashley J. Aldrin

at Univ at Albany

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Publications (1)

Proceedings Article | 23 April 2024 Presentation + Paper

Controlling chemical segregation in EUV resists by varying viscosity and evaporation rate during the spin coating process

Eshan Thilakarathna, Jarron Maguire, Ashley Aldrin, Gregory Denbeaux, Robert Brainard

Proceedings Volume 12957, 1295709 (2024) https://doi.org/10.1117/12.3010930

KEYWORDS: Annealing, Photoresist processing, Coating, Viscosity, Solids, Polymers, Film thickness, Thin film coatings, Stochastic processes, Photoresist materials

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