Atsushi Tatsugawa
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 25 September 2010 Paper
Atsushi Tatsugawa, Noriko Yamashita, Tadashi Oomatsu, Kenji Saitou, Takashi Katou, Toshihide Ishioka, Kazuyuki Usuki
Proceedings Volume 7823, 78233L (2010) https://doi.org/10.1117/12.864192
KEYWORDS: Quartz, Nickel, Silicon, Servomechanisms, Nanoimprint lithography, Reactive ion etching, Ultraviolet radiation, Line width roughness, Semiconducting wafers, Photomasks

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top