Dr. Barry Gotlinsky Profile

Dr. Barry Gotlinsky

Vice President SLS at Pall Corp

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Author

Publications (4)

Proceedings Article | 1 April 2009 Paper

Microbridge and e-test opens defectivity reduction via improved filtration of photolithography fluids

Michael Mesawich, Michael Sevegney, Barry Gotlinsky, Santos Reyes, Patrick Abbott, Jeremy Marzani, Mario Rivera

Proceedings Volume 7273, 72730O (2009) https://doi.org/10.1117/12.814374

KEYWORDS: Ozone, Particles, Optical lithography, Microfluidics, Manufacturing, Photoresist materials, Back end of line, Semiconductors, Bridges, Lithography

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Proceedings Article | 14 May 2004 Paper

Optimized filtration for reduced defectivity and improved dispense recipe in 193-nm BARC lithography

Phong Do, Joe Pender, Thomas Lehmann, Leo Mc Ardle, Barry Gotlinsky, Michael Mesawich

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535557

KEYWORDS: Etching, Lithography, 193nm lithography, Industrial chemicals, Semiconducting wafers, Metals, Photoresist materials, Polymers, Chemistry, Logic

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Proceedings Article | 12 June 2003 Paper

Spin-on bottom antireflective coating defect reduction by proper filter selection and process optimization

Nickolas Brakensiek, Brian Kidd, Michael Mesawich, Don Stevens, Barry Gotlinsky

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485101

KEYWORDS: Coating, Diffractive optical elements, Manufacturing, Thin film coatings, Semiconducting wafers, Bottom antireflective coatings, Chemistry, Sensors, Digital filtering, Particles

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Proceedings Article | 23 June 2000 Paper

Measuring the effects of sub-0.1-um filtration on 248-nm photoresist performance

Barry Gotlinsky, James Beach, Michael Mesawich

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388292

KEYWORDS: Photoresist materials, Semiconducting wafers, Nitrogen, Deep ultraviolet, Particles, Polymers, Optical lithography, Contamination, Scanning electron microscopy, Tin

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