Dr. Brian Martin Profile

Dr. Brian Martin

Principal Engineer at X-FAB UK Ltd

SPIE Involvement:

Author

Publications (38)

Proceedings Article | 11 March 2002 Paper

Comparison of contact hole definition using laser and shaped e-beam mask writers and its influence on wafer level pattern fidelity

Brian Martin, Robert Lloyd, Gareth Davies, Graham Arthur

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458330

KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Manufacturing, Modeling, Etching, Point spread functions, Image processing, Chlorine, Laser manufacturing

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Proceedings Article | 22 August 2001 Paper

Enhancing the rules for optical proximity correction to improve process latitude

Brian Martin, Graham Arthur

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436788

KEYWORDS: Optical proximity correction, Lithography, Matrices, OLE for process control, Nanoimprint lithography, Optical lithography, Reticles, Semiconducting wafers, Semiconductors, Data processing

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Proceedings Article | 22 August 2001 Paper

Optimization of dielectric antireflective coatings on a transparent substrate in sub-half-micron CMOS technology

Graham Arthur, Brian Martin, Christine Wallace

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436790

KEYWORDS: Reflectivity, Dielectrics, Oxides, Critical dimension metrology, Antireflective coatings, Lithography, CMOS technology, Thin films, Process control, Chemical mechanical planarization

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Proceedings Article | 22 August 2001 Paper

Swing curve phase and amplitude effects in optical lithography

Brian Martin, Tom Tighe, Graham Arthur

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436785

KEYWORDS: Scanning electron microscopy, Optical lithography, Lithography, Semiconducting wafers, Interfaces, Refractive index, Array processing, Oxygen, Semiconductors, Modeling

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Proceedings Article | 26 April 2001 Paper

Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA

Graham Arthur, Brian Martin

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425208

KEYWORDS: Lithography, Picture Archiving and Communication System, Photoresist developing, Microelectromechanical systems, Photoresist materials, Diffusion, Ultrasonics, Data modeling, Optical lithography, Optical simulations

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Proceedings Article | 20 April 2001 Paper

Stepper lens field critical dimension uniformity and optical proximity correction

Brian Martin

Proceedings Volume 4405, (2001) https://doi.org/10.1117/12.425244

KEYWORDS: Optical proximity correction, Lithography, Reticles, Critical dimension metrology, Manufacturing, Semiconducting wafers, Image processing, Photoresist processing, Process control, Semiconductors

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Proceedings Article | 20 April 2001 Paper

Some measurements on the effects of developer depletion

Brian Martin, Tom Tighe

Proceedings Volume 4405, (2001) https://doi.org/10.1117/12.425249

KEYWORDS: Semiconducting wafers, Reticles, Cadmium, Photoresist developing, Critical dimension metrology, Process control, Semiconductors, Photoresist materials, Lithography, Metals

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Proceedings Article | 2 June 2000 Paper

Pitch-dependent intrafield dimensional offsets in advanced lithography

Christine Wallace, Brian Martin, Graham Arthur

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386519

KEYWORDS: Lithography, Critical dimension metrology, Silicon, Calibration, Modeling, Data modeling, Manufacturing, Process control, Optical lithography, Image processing

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Proceedings Article | 2 June 2000 Paper

Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis

Graham Arthur, Brian Martin, Christine Wallace

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386516

KEYWORDS: Optical proximity correction, Lithography, Shape analysis, Error analysis, Reticles, Silicon, Optical design, Photoresist materials, Scanning electron microscopy, Optical lithography

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Proceedings Article | 2 June 2000 Paper

Metric for process optimization on substrates with transparent stacks in optical lithography

Brian Martin, Graham Arthur

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386517

KEYWORDS: Photoresist processing, Optical lithography, Silicon, Einsteinium, Photoresist materials, Standards development, Lithography, Interfaces, Image processing, Reflection

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Proceedings Article | 2 June 2000 Paper

Application of optical proximity correction in manufacturing and its effect on process control

Christine Wallace, Claire Duncan, Brian Martin

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386521

KEYWORDS: Reticles, Optical proximity correction, Semiconducting wafers, Process control, Manufacturing, Optics manufacturing, Lithography, OLE for process control, Semiconductors, Critical dimension metrology

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Proceedings Article | 14 June 1999 Paper

Mask error factor and critical dimension budgets for sub-half-micron CMOS processes

Graham Arthur, Brian Martin

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350880

KEYWORDS: Reticles, Optical proximity correction, Photomasks, Matrices, Lithography, Critical dimension metrology, Manufacturing, Photoresist processing, Semiconducting wafers, Coherence (optics)

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Proceedings Article | 28 April 1999 Paper

Effect of reticle manufacturing quality on full chip optical proximity correction

Brian Martin, Graham Arthur

Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346894

KEYWORDS: Reticles, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Optics manufacturing, Critical dimension metrology, Image processing, Wafer-level optics, Photoresist materials

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Proceedings Article | 28 April 1999 Paper

Analysis technique for quantifying the effectiveness of optical-proximity-corrected photomasks and its application to defect printability

Graham Arthur, Brian Martin

Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346895

KEYWORDS: Optical proximity correction, Reticles, Photomasks, Manufacturing, Tolerancing, Image analysis, Error analysis, Lithography, Critical dimension metrology, 3D image processing

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Proceedings Article | 28 April 1999 Paper

Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography

Christine Wallace, Brian Martin, Graham Arthur

Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346896

KEYWORDS: Critical dimension metrology, Photoresist processing, Deep ultraviolet, Photoresist materials, Image processing, Optical lithography, Nanoimprint lithography, Lithography, Lenses, Cadmium

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Proceedings Article | 18 December 1998 Paper

Full-chip optical proximity correction using lithography simulation

Graham Arthur, Brian Martin, Christine Wallace, Anja Rosenbusch, Huw Fryer

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332847

KEYWORDS: Optical proximity correction, Reticles, Lithography, Critical dimension metrology, Photomasks, Semiconducting wafers, Photoresist materials, Image processing, Silicon, Manufacturing

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Proceedings Article | 8 June 1998 Paper

Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates

Brian Martin, Graham Arthur, Christine Wallace

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308746

KEYWORDS: Reflectivity, Photoresist materials, Semiconducting wafers, Lithography, Image processing, Photoresist processing, Scanning electron microscopy, Optical lithography, Optics manufacturing, Modeling

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Proceedings Article | 8 June 1998 Paper

Comparison of recent development models in optical lithography simulation

Graham Arthur, Christine Wallace, Brian Martin

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308765

KEYWORDS: Data modeling, Photoresist developing, Performance modeling, Photoresist materials, Visualization, Optical lithography, Optical simulations, Picture Archiving and Communication System, Photoresist processing, Diffusion

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Proceedings Article | 8 June 1998 Paper

Definition and control of contact holes in a CMP process

Christine Wallace, Brian Martin, Graham Arthur

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308772

KEYWORDS: Chemical mechanical planarization, Oxides, Photoresist processing, Critical dimension metrology, Semiconducting wafers, Etching, Scanning electron microscopy, Photography, Bottom antireflective coatings, Antireflective coatings

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Proceedings Article | 7 July 1997 Paper

Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime

Graham Arthur, Brian Martin, Chris Mack

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275818

KEYWORDS: Picture Archiving and Communication System, Standards development, Photoresist developing, Photoresist materials, Diffusion, Scanning electron microscopy, Data modeling, Lithography, Modeling, Optical lithography

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Proceedings Article | 7 July 1997 Paper

Effect of reticle bias on isofocal process performance at subhalfmicron resolution

Brian Martin, Graham Arthur

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275909

KEYWORDS: Reticles, Chlorine, Phase shifts, Picosecond phenomena, Computer simulations, Optical lithography, Binary data, Photoresist processing, Semiconductors, Optical simulations

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Proceedings Article | 12 February 1997 Paper

Manufacture of photomasks for critical layers of sub-half-micron CMOS technology

Brian Martin, Tim Waring

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301201

KEYWORDS: Photomasks, Manufacturing, Critical dimension metrology, CMOS technology, Chromium, Semiconductors, Semiconducting wafers, Optical testing, Curium, Standards development

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Proceedings Article | 21 May 1996 Paper

Subhalf-micron polysilicon gate control from 365- to 193-nm exposure

Brian Martin, Graham Arthur

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240137

KEYWORDS: Reflectivity, Refractive index, Interfaces, Absorption, Thin films, Lithography, Bottom antireflective coatings, Chemically amplified resists, Reflection, Oxides

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Proceedings Article | 21 May 1996 Paper

Assessment of resist-specific isofocal behavior in optical lithography at half-micron resolution

Graham Arthur, Brian Martin

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240136

KEYWORDS: Picture Archiving and Communication System, Photoresist materials, Photoresist developing, Optical lithography, Computer simulations, Chlorine, Photoresist processing, Modeling, Lithography, Photomasks

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Proceedings Article | 21 May 1996 Paper

Minimizing optical proximity effect at subhalf-micron resolution by the variation of stepper lens operating conditions at i-line, 248-nm, and 193-nm wavelengths

Graham Arthur, Brian Martin

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240130

KEYWORDS: Reticles, Optical proximity correction, Chlorine, Photomasks, Computer simulations, Reflectivity, Solids, Wafer-level optics, Photoresist materials, Semiconducting wafers

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Proceedings Article | 26 May 1995 Paper

Partial rim: a new design of rim phase shift mask for submicron contact holes

Zheng Cui, Philip Prewett, Brian Martin

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209284

KEYWORDS: Photomasks, Image enhancement, Phase shifts, Image quality, Computer simulations, Lithography, Semiconducting wafers, Etching, Quartz, Reticles

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Proceedings Article | 22 May 1995 Paper

Modeling the effect of defocus on the printability of submicrometer 5X reticle defects at g-line, i-line, and DUV wavelengths

Graham Arthur, Brian Martin

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209230

KEYWORDS: Reticles, Deep ultraviolet, Modeling, Solids, Photoresist materials, Opacity, 3D image processing, 3D modeling, Computer simulations, Photomasks

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Proceedings Article | 22 May 1995 Paper

Printability and repair of defects in rim and attenuated phase shift masks

Philip Prewett, Zheng Cui, John Watson, Brian Martin

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209204

KEYWORDS: Phase shifts, Photomasks, Gallium, Ion beams, Opacity, Ions, Lithography, Optical lithography, Signal attenuation, Carbon

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Proceedings Article | 22 May 1995 Paper

Effect of numerical aperture and partial coherence on i-line swing curve amplitude at sub-half-micrometer resolution

Brian Martin, Graham Arthur

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209232

KEYWORDS: Reflectivity, Refractive index, Solids, Critical dimension metrology, Silicon, Absorption, Photoresist processing, Modeling, Optical lithography, Interfaces

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Proceedings Article | 17 May 1994 Paper

Comparison of phase-shift mask types for submicrometer contact hole definition

Zheng Cui, Brian Martin, Philip Prewett, Steve Johnson, Philip Herman

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175420

KEYWORDS: Photomasks, Phase shifts, Binary data, Lithography, Computer simulations, Image analysis, Quartz, Etching, Transmittance, Semiconductors

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Proceedings Article | 1 May 1994 Paper

Effect of resist processes on dimensional control of submicron polysilicon gate structures

Brian Martin, Graham Arthur

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174157

KEYWORDS: Photoresist processing, Process control, Semiconducting wafers, Antireflective coatings, Calibration, Control systems, Low pressure chemical vapor deposition, Manufacturing, CMOS devices, CMOS technology

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Proceedings Article | 1 May 1994 Paper

Effects on IC quality of 5X reticle repair using FIB with stain reduction

Philip Prewett, Brian Martin, John Watson, Rik Jonckheere

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174127

KEYWORDS: Reticles, Semiconducting wafers, Ion beams, Opacity, Deep ultraviolet, Plasma, Lithography

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Proceedings Article | 1 May 1994 Paper

Printability of submicron 5X reticle defects at G-line, I-line, and deep UV exposure wavelengths

Graham Arthur, Brian Martin, Francis Goodall, Ian Loader

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174155

KEYWORDS: Reticles, Deep ultraviolet, 3D modeling, Computer simulations, Photoresist materials, Photoresist developing, Solids

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Proceedings Article | 15 February 1994 Paper

Characterization of defect sizing on an automatic inspection system (KLA238e)

Dave Stocker, Brian Martin, Jeffrey Browne

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167271

KEYWORDS: Reticles, Calibration, Inspection, Optical testing, Image analysis, Photomask technology, Defect detection, Semiconducting wafers, Manufacturing, Semiconductors

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Proceedings Article | 4 August 1993 Paper

FIB repair of 5x reticles and effects on IC quality

Philip Prewett, Brian Martin, A. Eastwood, John Watson

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.148984

KEYWORDS: Reticles, Ions, Gallium, Quartz, Opacity, Ion beams, Semiconducting wafers, Photomasks, Optical lithography, Carbon

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Proceedings Article | 4 August 1993 Paper

Printability of submicron 5x reticle defects at i-line and DUV exposure wavelengths

Brian Martin, Francis Goodall

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.148990

KEYWORDS: Reticles, Deep ultraviolet, Semiconducting wafers, Modeling, Photoresist processing, Inspection, 3D modeling, Manufacturing, Wafer-level optics, Solids

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Proceedings Article | 1 June 1992 Paper

Novel resist patterning strategies for the definition of high resolution via holes in polyimide interlayer dielectric

Brian Martin, Neil Harper

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59769

KEYWORDS: Etching, Resistance, Lithography, Semiconducting wafers, Photoresist processing, Oxygen, Photomasks, Plasma, Silicon, Optical lithography

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Proceedings Article | 1 July 1991 Paper

Two-layer 1.2-micron pitch multilevel metal demonstrator using resist patterning by surface imaging and dry development

Brian Martin, Ian Snowden, Simon Mortimer

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44787

KEYWORDS: Metals, Photoresist processing, Etching, Semiconducting wafers, Deep ultraviolet, Optical lithography, Oxygen, Ions, Reactive ion etching, Photomasks

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Showing 5 of 38 publications

Conference Committee Involvement (4)

Metrology, Inspection, and Process Control for Microlithography XX

20 February 2006 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XIX

28 February 2005 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XVIII

23 February 2004 | Santa Clara, California, United States

Metrology, Inspection, and Process Control for Microlithography XVII

24 February 2003 | Santa Clara, California, United States

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