Mr. Brian M. Tyrrell Profile

Brian M. Tyrrell

at MIT Lincoln Lab

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 1 July 2014 Paper

Smart pixel imaging with computational-imaging arrays

Christy Fernandez-Cull, Brian Tyrrell, Richard D'Onofrio, Andrew Bolstad, Joseph Lin, Jeffrey Little, Megan Blackwell, Matthew Renzi, Mike Kelly

Proceedings Volume 9070, 90703D (2014) https://doi.org/10.1117/12.2057520

KEYWORDS: Sensors, Imaging arrays, Image filtering, Camera shutters, Image compression, Staring arrays, 3D acquisition, Short wave infrared radiation, Computational imaging, Imaging systems

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Proceedings Article | 24 June 2014 Paper

Digital pixel CMOS focal plane array with on-chip multiply accumulate units for low-latency image processing

Jeffrey Little, Brian Tyrrell, Richard D'Onofrio, Paul Berger, Christy Fernandez-Cull

Proceedings Volume 9070, 90703B (2014) https://doi.org/10.1117/12.2057519

KEYWORDS: Image processing, Staring arrays, Readout integrated circuits, Detection and tracking algorithms, Wavefront sensors, Logic, Digital signal processing, Cameras, Imaging systems, Quantization

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Proceedings Article | 23 January 2010 Paper

Digital-pixel focal plane array development

Matthew Brown, Justin Baker, Curtis Colonero, Joe Costa, Tom Gardner, Mike Kelly, Ken Schultz, Brian Tyrrell, Jim Wey

Proceedings Volume 7608, 76082H (2010) https://doi.org/10.1117/12.838314

KEYWORDS: Readout integrated circuits, Staring arrays, Analog electronics, Sensors, Linear filtering, Mercury cadmium telluride, Diodes, Capacitors, Capacitance, Signal processing

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Proceedings Article | 1 April 2008 Paper

Integration of high-speed surface-channel charge coupled devices into an SOI CMOS process using strong phase shift lithography

Jeffrey Knecht, Vladimir Bolkhovsky, Jay Sage, Brian Tyrrell, Bruce Wheeler, Charles Wynn

Proceedings Volume 6924, 69244R (2008) https://doi.org/10.1117/12.777133

KEYWORDS: Charge-coupled devices, Photomasks, Phase shifts, Signal processing, Lithography, Etching, CMOS technology, Critical dimension metrology, Double patterning technology, Photoresist materials

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Proceedings Article | 1 February 2008 Paper

Design approaches for digitally dominated active pixel sensors: leveraging Moore's Law scaling in focal plane readout design

Brian Tyrrell, Robert Berger, Curtis Colonero, Joseph Costa, Michael Kelly, Eric Ringdahl, Kenneth Schultz, James Wey

Proceedings Volume 6900, 69000W (2008) https://doi.org/10.1117/12.767272

KEYWORDS: Readout integrated circuits, Sensors, Staring arrays, Signal to noise ratio, Interference (communication), Analog electronics, Filtering (signal processing), Long wavelength infrared, Signal processing, CMOS technology

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Proceedings Article | 11 January 2007 Paper

Lincoln Laboratory high-speed solid-state imager technology

R. Reich, D. Rathman, D. O'Mara, D. Young, A. Loomis, R. Osgood, R. Murphy, M. Rose, R. Berger, B. Tyrrell, S. Watson, M. Ulibarri, T. Perry, F. Weber, H. Robey

Proceedings Volume 6279, 62791K (2007) https://doi.org/10.1117/12.725189

KEYWORDS: Imaging systems, Charge-coupled devices, Camera shutters, Picosecond phenomena, Solid state electronics, Sensors, Silicon, Clocks, Quantum efficiency, X-ray detectors

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Proceedings Article | 6 May 2005 Paper

High-throughput hybrid optical maskless lithography: all-optical 32-nm node imaging

M. Fritze, B. Tyrrell, T. Fedynyshyn, M. Rothschild, P. Brooker

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.612856

KEYWORDS: Photomasks, Lithography, Photoresist materials, Maskless lithography, Hybrid optics, Optical lithography, Image resolution, Binary data, Critical dimension metrology, Projection lithography

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Proceedings Article | 3 May 2004 Paper

Minimizing mask complexity for advanced optical lithography

Michael Fritze, Brian Tyrrell

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536369

KEYWORDS: Lithography, Photomasks, Resolution enhancement technologies, Spatial frequencies, Electronic design automation, Optical lithography, Image compression, Phase shifts, Optical proximity correction, Manufacturing

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Proceedings Article | 10 July 2003 Paper

Dense only phase-shift template lithography

Michael Fritze, Brian Tyrrell, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485244

KEYWORDS: Photomasks, Lithography, Resolution enhancement technologies, Semiconducting wafers, Phase shifts, Optical proximity correction, Spatial frequencies, Computer aided design, Wafer-level optics, Neodymium

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SPIE Journal Paper | 1 October 2002

Investigation of the physical and practical limits of dense-only phase shift lithography for circuit feature definition

Brian Tyrrell, Michael Fritze, David Astolfi, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1503349

KEYWORDS: Photomasks, Lithography, Phase shifts, Image processing, Optical proximity correction, Semiconducting wafers, Optical lithography, Inspection, Binary data, System on a chip

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Proceedings Article | 30 July 2002 Paper

Minimization of image placement errors in chromeless phase-shift mask lithography

Michael Fritze, Brian Tyrrell, Susan Cann, Chris Carney, Betty Blachowicz, David Brzozowy, Thomas Kocab, Scott Bowdoin, Peter Rhyins, Christopher Progler, Patrick Martin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474592

KEYWORDS: Image processing, Photomasks, Phase shifts, Lithography, Etching, Quartz, Coherence (optics), Mask making, Photoresist processing, Metrology

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Proceedings Article | 12 July 2002 Paper

Investigation of the physical and practical limits of dense-only phase-shift lithography for circuit feature definition

Brian Tyrrell, Michael Fritze, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475686

KEYWORDS: Photomasks, Lithography, Phase shifts, Semiconducting wafers, Optical proximity correction, Optical lithography, Image processing, Inspection, Binary data, Photoresist processing

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Proceedings Article | 14 September 2001 Paper

100-nm node lithography with KrF?

Michael Fritze, Brian Tyrrell, David Astolfi, Donna Yost, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, Hua-Yu Liu, M. Ma, David Chan, Peter Rhyins, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435719

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Photoresist processing, Optical lithography, Optics manufacturing, Image processing, Scanning electron microscopy, Double patterning technology, Etching

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Proceedings Article | 22 August 2001 Paper

Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Michael Fritze, Brian Tyrrell, David Astolfi, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, David Chan, Peter Rhyins, Martin Mastovich, Neal Sullivan, Robert Brandom, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436759

KEYWORDS: Lithography, Semiconducting wafers, Optical lithography, Photomasks, Critical dimension metrology, Reticles, Cadmium, Resolution enhancement technologies, Metrology, Phase shifts

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Showing 5 of 14 publications

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