Dr. Byung-Sung Kim Profile

Dr. Byung-Sung Kim

Senior Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (6)

Proceedings Article | 23 March 2011 Paper

Applicability of global source mask optimization to 22/20nm node and beyond

Kehan Tian, Moutaz Fakhry, Aasutosh Dave, Alexander Tritchkov, Jaione Tirapu-Azpiroz, Alan Rosenbluth, David Melville, Masaharu Sakamoto, Tadanobu Inoue, Scott Mansfield, Alexander Wei, Young Kim, Bruce Durgan, Kostas Adam, Gabriel Berger, Gandharv Bhatara, Jason Meiring, Henning Haffner, Byung-Sung Kim

Proceedings Volume 7973, 79730C (2011) https://doi.org/10.1117/12.879703

KEYWORDS: Source mask optimization, Photomasks, Resolution enhancement technologies, Optical proximity correction, Tolerancing, Optical lithography, SRAF, Image processing, Lithography, Semiconducting wafers

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Proceedings Article | 3 April 2010 Open Access

Taming the final frontier of optical lithography: design for sub-resolution patterning

Lars Liebmann, Jongwook Kye, Byung-Sung Kim, Lei Yuan, Jean-Pierre Geronimi

Proceedings Volume 7641, 764105 (2010) https://doi.org/10.1117/12.847222

KEYWORDS: Optical lithography, Photomasks, Semiconducting wafers, Image quality, Lithography, Image processing, Semiconductors, Double patterning technology, Second-harmonic generation, Lithographic illumination

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Proceedings Article | 9 June 2009 Paper

Trade-off between inverse lithography mask complexity and lithographic performance

Byung-Gook Kim, Sung Soo Suh, Byung-Sung Kim, Sang-Gyun Woo, Han-Ku Cho, Vikram Tolani, Grace Dai, Dave Irby, Kechang Wang, Guangming Xiao, David Kim, Ki-Ho Baik, Bob Gleason

Proceedings Volume 7379, 73791M (2009) https://doi.org/10.1117/12.824299

KEYWORDS: Photomasks, Lithography, Inspection, Logic, Manufacturing, Optical proximity correction, Model-based design, Scanning electron microscopy, Image processing, Systems modeling

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Proceedings Article | 17 October 2008 Paper

Pixel-based SRAF implementation for 32nm lithography process

Byung-Sung Kim, Yoo-Hyun Kim, Sung-Ho Lee, Sung-Il Kim, Sang-Rok Ha, Juhwan Kim, Alexander Tritchkov

Proceedings Volume 7122, 71220T (2008) https://doi.org/10.1117/12.801310

KEYWORDS: SRAF, Photomasks, Manufacturing, Optical proximity correction, Lithography, Photovoltaics, Semiconducting wafers, Double patterning technology, Image enhancement, Logic

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Proceedings Article | 7 March 2008 Paper

Evaluating the accuracy of a calibrated rigorous physical resist model under various process and illumination conditions

Stewart Robertson, Byung-Sung Kim, Woon-Hyuk Choi, Yoo-Hyon Kim, John Biafore, Mark Smith

Proceedings Volume 6924, 692411 (2008) https://doi.org/10.1117/12.772766

KEYWORDS: Calibration, Data modeling, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Photomasks, Error analysis, Process modeling, Computer simulations, Wafer-level optics

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Proceedings Article | 27 March 2007 Paper

Size tolerance of sub-resolution assist features for sub-50-nm node device

Byung-Sung Kim, Sung-Ho Lee, Hong-Jae Shin, Nae-In Lee

Proceedings Volume 6520, 652027 (2007) https://doi.org/10.1117/12.711922

KEYWORDS: SRAF, Critical dimension metrology, Photomasks, Tolerancing, Lithography, Control systems, Semiconducting wafers, Lithographic illumination, Electromagnetism, Phase shifts

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Showing 5 of 6 publications

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