Mr. Christopher K. Magg Profile

Christopher K. Magg

at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 8 November 2005 Paper

Implications of wafer design for manufacturing practices on photomask manufacturing

Andrew Watts, Jed Rankin, Christopher Magg

Proceedings Volume 5992, 599227 (2005) https://doi.org/10.1117/12.632418

KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, Semiconducting wafers, Design for manufacturing, Inspection, Image processing, Semiconductor manufacturing, Yield improvement, SRAF

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Proceedings Article | 6 December 2004 Paper

Wavelength-dependent spot defects on advanced embedded attenuated phase-shift masks

Christopher Magg, Jason Benz, Louis Kindt, Adam Smith, Jay Burnham, Jeffrey Riendeau, Christy Johnson, Rick Kontra

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570563

KEYWORDS: Photomasks, Inspection, Particles, Chemical analysis, Aluminum, Silicon, Semiconducting wafers, Contamination, Manufacturing, Tantalum

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Proceedings Article | 11 March 2002 Paper

Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making

David Medeiros, Karen Petrillo, James Bucchignano, Marie Angelopoulos, Wu-Song Huang, Wenjie Li, Wayne Moreau, Robert Lang, Ranee Kwong, Christopher Magg, Brian Ashe

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458334

KEYWORDS: Etching, Photomasks, Resistance, Mask making, Lithography, Polymers, Scanning electron microscopy, Packaging, Plasma, Electron beam lithography

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Proceedings Article | 5 September 2001 Paper

High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making

Wu-Song Huang, Ranee Kwong, Wayne Moreau, Robert Lang, Christopher Robinson, David Medeiros, Karen Petrillo, Ari Aviram, Arpan Mahorowala, Marie Angelopoulos, Christopher Magg, Mark Lawliss, Thomas Faure

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438350

KEYWORDS: Etching, Silicon, Resistance, Mask making, Dry etching, Lithography, Photoresist processing, Chromium, Photomasks, Image resolution

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Proceedings Article | 24 August 2001 Paper

High resolution patterning in chemically amplified resists: the effect of film thickness

David Medeiros, Wayne Moreau, Karen Petrillo, Maharshi Chauhan, Wu-Song Huang, Christopher Magg, Dario Goldfarb, Marie Angelopoulos, Paul Nealey

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436853

KEYWORDS: Electron beam lithography, Electron beams, Scanning electron microscopy, Deep ultraviolet, Semiconducting wafers, Photomicroscopy, Chemically amplified resists, Thin films, Silicon, Modulation

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Proceedings Article | 20 August 2001 Paper

High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436656

KEYWORDS: Etching, Silicon, Resistance, Photomasks, Mask making, Lithography, Dry etching, Photoresist processing, Chromium, Image resolution

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Proceedings Article | 20 August 2001 Paper

Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks

Christopher Magg, Michael Lercel, Mark Lawliss, Robin Ackel, Neal Caldwell, Louis Kindt, Kenneth Racette, Carey Williams, Phillip Reu

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436664

KEYWORDS: Photomasks, Image processing, Electron beam lithography, Projection lithography, Silicon, Scattering, Etching, Lithography, Finite element methods, Image analysis

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Proceedings Article | 22 January 2001 Paper

Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

Christopher Magg, Michael Lercel, Mark Lawliss, Ranee Kwong, Wu-Song Huang, Marie Angelopoulos

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410750

KEYWORDS: Photomasks, Critical dimension metrology, X-rays, Image processing, Silicon, Photoresist processing, Silicon carbide, Lithography, Mask making, Temperature metrology

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Proceedings Article | 22 January 2001 Paper

UV inspection of EUV and SCALPEL reticles

Donald Pettibone, Noah Bareket, Ted Liang, Alan Stivers, Scott Hector, Pawitter Mangat, Douglas Resnick, Michael Lercel, Mark Lawliss, Christopher Magg, Anthony Novembre, Reginald Farrow

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410699

KEYWORDS: Photomasks, Inspection, Charged-particle lithography, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Silicon, Ultraviolet radiation, Chromium

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Proceedings Article | 21 July 2000 Paper

CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making

Ranee Kwong, Wu-Song Huang, John Hartley, Wayne Moreau, Christopher Robinson, Marie Angelopoulos, Christopher Magg, Mark Lawliss

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390071

KEYWORDS: Photomasks, Mask making, Lithography, Electron beam lithography, Charged-particle lithography, Silicon, Electron beams, Beam shaping, Printing, Photoresist processing

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Proceedings Article | 21 July 2000 Paper

Chemically amplified resists for electron-beam projection lithography mask fabrication

Christopher Magg, Michael Lercel

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390064

KEYWORDS: Photomasks, Scattering, Critical dimension metrology, Etching, Silicon, Photoresist processing, X-rays, Coating, Silicon carbide, Mask making

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Proceedings Article | 21 July 2000 Paper

Comparison of substrate curvature and resonant frequency thin film stress mapping techniques

Michael Schlax, Roxann Engelstad, Edward Lovell, Cameron Brooks, Christopher Magg

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390093

KEYWORDS: Photomasks, Diagnostics, Composites, Thin films, Semiconducting wafers, Silicon carbide, Lithography, Etching, Received signal strength, Sensors

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Proceedings Article | 21 July 2000 Paper

Image size control in next generation lithography masks

Michael Lercel, Christopher Magg

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390062

KEYWORDS: Photomasks, X-rays, Charged-particle lithography, Semiconducting wafers, Critical dimension metrology, Thermal modeling, Lithography, Silicon, Etching, Resistance

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Proceedings Article | 19 July 2000 Paper

CA resist with high sensitivity and sub-100-nm resolution for advanced mask making

Wu-Song Huang, Ranee Kwong, John Hartley, Wayne Moreau, Marie Angelopoulos, Christopher Magg, Mark Lawliss

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392026

KEYWORDS: Photomasks, Mask making, Etching, Lithography, Semiconducting wafers, Chromium, Beam shaping, Electron beam lithography, Optical proximity correction, Photoresist processing

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Proceedings Article | 19 July 2000 Paper

Next-generation lithography mask development at the NGL-MCOC

Michael Lercel, Kenneth Racette, Christopher Magg, Mark Lawliss, Kevin Collins, Monica Barrett, Michael Trybendis, Lucien Bouchard

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392049

KEYWORDS: Photomasks, Etching, X-rays, Image processing, Silicon, Scattering, Photoresist processing, Lithography, Diamond, Extreme ultraviolet lithography

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Proceedings Article | 30 December 1999 Paper

Next-generation lithography mask development at the NGL Mask Center of Competency

Michael Lercel, Cameron Brooks, Kenneth Racette, Christopher Magg, Mark Lawliss, Neal Caldwell, Raymond Jeffer, Kevin Collins, Monica Barrett, Steven Nash, Michael Trybendis, Lucien Bouchard

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373374

KEYWORDS: Photomasks, X-rays, Critical dimension metrology, Etching, Semiconducting wafers, Electron beam lithography, Silicon, Lithography, X-ray lithography, Extreme ultraviolet

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Showing 5 of 16 publications

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