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Da-Kyung Yu
at Hanyang Univ
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Publications (3)
Proceedings Article | 20 November 2024 Poster + Paper
Through pitch line width difference minimization by pixel source optimization
Proceedings Volume 13216, 132162L (2024) https://doi.org/10.1117/12.3037354
KEYWORDS: Optical proximity correction, Critical dimension metrology, Light sources and illumination, Semiconducting wafers, Mathematical optimization, Lithography, Extreme ultraviolet lithography, 3D mask effects, Source mask optimization
Proceedings Article | 20 November 2024 Poster + Paper
Improving process window and resolution through source polarization in High-NA EUV
Yu-Jin Chae, Min-Woo Kim, Da-Kyung Yu, Seung-woo Son, Michael Yeung, Hye-Keun Oh
Proceedings Volume 13216, 132162M (2024) https://doi.org/10.1117/12.3037370
KEYWORDS: Polarization, Light sources and illumination, Nanoimprint lithography, Extreme ultraviolet, Manufacturing, Extreme ultraviolet lithography, Image resolution, Optical lithography, Image quality, Source mask optimization
Proceedings Article | 12 November 2024 Poster + Paper
Source optimization for the whole arc slit with minimum optical proximity correction applied to contact hole patterns
Da-Kyung Yu, Min-Woo Kim, Gug-Yong Kim, Yu-Jin Chae, Seoung-woo Son, Michael Yeung, Hye-Keun Oh
Proceedings Volume 13215, 132151A (2024) https://doi.org/10.1117/12.3036974
KEYWORDS: Light sources and illumination, Optical proximity correction, Optical lithography, Extreme ultraviolet lithography, Light sources, Manufacturing, Lithography, Mathematical optimization, Source mask optimization
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