Mr. DaeHo Hwang Profile

DaeHo Hwang

at SKhynix

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Author

Publications (6)

Proceedings Article | 8 October 2014 Paper

Characteristics and issues of haze management in a wafer fabrication environment

Sung Ha Woo, Dae Ho Hwang, Goo Min Jeong, Young Mo Lee, Sang Pyo Kim, Dong Gyu Yim

Proceedings Volume 9235, 923524 (2014) https://doi.org/10.1117/12.2066275

KEYWORDS: Air contamination, Photomasks, Laser therapeutics, Pellicles, Semiconducting wafers, Metrology, Critical dimension metrology, Laser processing, Inspection, Chromium

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Proceedings Article | 8 November 2012 Paper

Advanced photomask fabrication process to increase pattern reliability for sub-20nm node

Dong Shin, Sang Jo, Hee Jang, Yun Hong, Dae Hwang, Chung Choi, Dong Jang, Ho Jung, Tae Ha, Sang Kim, Dong Yim

Proceedings Volume 8522, 85220R (2012) https://doi.org/10.1117/12.964974

KEYWORDS: Etching, Chromium, Photomasks, Particles, Critical dimension metrology, Inspection, Reliability, Optics manufacturing, Manufacturing

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Proceedings Article | 8 June 2010 Paper

Photomask defect detection and inspection: aerial imaging and high resolution inspection strategies

Sunghyun Oh, DaeHo Hwang, Inpyo Kim, Changreol Kim, Aviram Tam, Michael Ben Yishai, Yulian Wolff

Proceedings Volume 7748, 774827 (2010) https://doi.org/10.1117/12.869574

KEYWORDS: Inspection, Photomasks, SRAF, Defect detection, Image resolution, Critical dimension metrology, Airborne remote sensing, Artificial intelligence, Optics manufacturing, Signal detection

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Proceedings Article | 25 October 2007 Paper

Mask inspection method for 45nm node device

Sunghyun Oh, Yongkyoo Choi, Daeho Hwang, Goomin Jeong, Oscar Han

Proceedings Volume 6730, 673029 (2007) https://doi.org/10.1117/12.746864

KEYWORDS: Inspection, Photomasks, Reflectivity, Critical dimension metrology, Wafer-level optics, Pellicles, Light, Semiconducting wafers, Defect inspection, Resolution enhancement technologies

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Proceedings Article | 15 May 2007 Paper

Evaluation of litho printability of DRAM contact hole patterns with various programmed defects

KangJoon Seo, SangIee Lee, HyunYoung Kim, DaeHo Hwang, Sangpyo Kim, Goomin Jeong, Oscar Han, Chunlin Chen, David Yee, EunJi Kim, KiHun Park, NamWook Kim, Sunny Choi, David Kim, Shrinkant Lohokare

Proceedings Volume 6607, 66072D (2007) https://doi.org/10.1117/12.728996

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Reticles, Tolerancing, Scanning electron microscopy, Lithography, Manufacturing, Printing, Critical dimension metrology

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Proceedings Article | 20 October 2006 Paper

Optimization of development process using after develop inspection in mask manufacturing

Hyun Young Kim, Dae Ho Hwang, Sang Pyo Kim, Oscar Han, Ki Hun Park, Nam Wook Kim, David Kim

Proceedings Volume 6349, 63493Q (2006) https://doi.org/10.1117/12.702033

KEYWORDS: Inspection, Antimony, Etching, Algorithm development, Calibration, Defect detection, Chromium, Reflectivity, Critical dimension metrology, Photomasks

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Showing 5 of 6 publications

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