Mr. Dai Tsunoda Profile

Dai Tsunoda

Manager at Nippon Control System Corp

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Publications (10)

Proceedings Article | 13 October 2020 Poster + Paper

Mask contribution to OPC model accuracy

Adam Lyons, Tom Wallow, Christoph Hennerkes, Chris Spence, Maxence Delorme, David Rio, Dai Tsunoda, Yohei Torigoe, Masakazu Hamaji

Proceedings Volume 11517, 115171D (2020) https://doi.org/10.1117/12.2573160

KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Process modeling, Extreme ultraviolet, Semiconducting wafers, Metrology, Calibration, Finite element methods

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Proceedings Article | 20 September 2020 Presentation

Free form data reduction for MPC

Dai Tsunoda, Yasuaki Horima, Yohei Torigoe, Brian Dillon, Adam Lyons, Tom Wallow, Kurt Wampler, Vincent Shu, Quan Zhang

Proceedings Volume 11518, 115180P (2020) https://doi.org/10.1117/12.2573132

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Device simulation, Semiconducting wafers, Optical simulations

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Proceedings Article | 3 October 2018 Paper

Applying MPC for EUV mask fabrication

Dai Tsunoda, Yohei Torigoe, Yutaro Sato, Masakazu Hamaji, Gek-Soon Chua, Christian Bürgel

Proceedings Volume 10810, 108101H (2018) https://doi.org/10.1117/12.2502068

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Calibration, Extreme ultraviolet lithography, Critical dimension metrology, Mask making

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Proceedings Article | 4 October 2016 Paper

OPC care-area feedforwarding to MPC

Brian Dillon, Yi-Hsing Peng, Masakazu Hamaji, Dai Tsunoda, Tomoyuki Muramatsu, Shuichiro Ohara, Yi Zou, Vincent Arnoux, Stanislas Baron, Xiaolong Zhang

Proceedings Volume 9985, 99851A (2016) https://doi.org/10.1117/12.2242972

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

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Proceedings Article | 23 October 2015 Paper

Mask process simulation for mask quality improvement

Nobuyasu Takahashi, So Goto, Dai Tsunoda, So-Eun Shin, Sukho Lee, Jungwook Shon, Jisoong Park

Proceedings Volume 9635, 96351G (2015) https://doi.org/10.1117/12.2196713

KEYWORDS: Photomasks, Process modeling, Calibration, Error analysis, Computer simulations, Etching, Statistical modeling, Scanning electron microscopy, Photoresist processing, Cadmium

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Proceedings Article | 25 September 2010 Paper

Proximity effect correction concerning forward scattering

Dai Tsunoda, Masahiro Shoji, Hiroyuki Tsunoe

Proceedings Volume 7823, 78233D (2010) https://doi.org/10.1117/12.864189

KEYWORDS: Scattering, Laser scattering, Photomasks, Chemical species, Lithography, Molecules, Convolution, Modulation, Parallel processing, Critical dimension metrology

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Proceedings Article | 2 April 2010 Paper

Proximity effects correction for sub-10nm patterning node

Piotr Jedrasik, Dai Tsunoda, Masahiro Shoji, Hiroyuki Tsunoe

Proceedings Volume 7638, 76383B (2010) https://doi.org/10.1117/12.848337

KEYWORDS: Electron beam lithography, Scattering, Laser scattering, Electron beams, Calibration, Semiconducting wafers, Analytical research, Photoresist processing, Hydrogen, Critical dimension metrology

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Proceedings Article | 18 March 2009 Paper

Proximity effect correction for 20nm dimension patterning

Dai Tsunoda, Masahiro Shoji, Mitsuko Tatsugawa, Hiroyuki Tsunoe, Yusuke Iino, Piotr Jedrasik

Proceedings Volume 7271, 72712S (2009) https://doi.org/10.1117/12.813971

KEYWORDS: Scattering, Lithography, Semiconducting wafers, Electron beam lithography, Point spread functions, Electron beam direct write lithography, Data conversion, Silicon, Molecules, Scanning electron microscopy

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Proceedings Article | 20 May 2006 Paper

New proximity effect correction for under 100 nm patterns

Masahiro Shoji, Nobuyasu Horiuchi, Tomoyuki Chikanaga, Takashi Niinuma, Dai Tsunoda

Proceedings Volume 6283, 62832L (2006) https://doi.org/10.1117/12.681796

KEYWORDS: Scattering, Parallel processing, Modulation, Energy efficiency, Computer simulations, Detection and tracking algorithms, Data modeling, Control systems, Electron beam direct write lithography, Computing systems

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Proceedings Article | 24 March 2006 Paper

New proximity effect correction for under 100nm patterns

Masahiro Shoji, Nobuyasu Horiuchi, Tomoyuki Chikanaga, Takashi Niinuma, Dai Tsunoda

Proceedings Volume 6151, 615128 (2006) https://doi.org/10.1117/12.656079

KEYWORDS: Scattering, Data conversion, Data centers, Computer aided design, Data corrections, Solid modeling, Mirrors, Data compression, Control systems, Electron beam direct write lithography

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Showing 5 of 10 publications

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