Dr. Dan Meisburger Profile

Dr. Dan Meisburger

at Tec-Start Consulting

SPIE Involvement:

Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author

Publications (4)

Proceedings Article | 16 September 2014 Paper

On the limits of miniature electron column technology

Lawrence Muray, James Spallas, Dan Meisburger

Proceedings Volume 9236, 92360C (2014) https://doi.org/10.1117/12.2068617

KEYWORDS: Lenses, Optics manufacturing, Tolerancing, Electron beams, Objectives, Silicon, Charged particle optics, Manufacturing, Wafer-level optics, Monte Carlo methods

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Proceedings Article | 11 February 2011 Paper

High speed maskless lithography of printed circuit boards using digital micromirrors

Eric Hansotte, Edward Carignan, W. Dan Meisburger

Proceedings Volume 7932, 793207 (2011) https://doi.org/10.1117/12.875599

KEYWORDS: Digital micromirror devices, Mirrors, Binary data, Lithography, Photomasks, Distortion, Printing, Control systems, Image resolution, Digital electronics

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Proceedings Article | 15 November 1999 Paper

Global space charge effects in high-throughput electron-beam lithography

Liqun Han, W. Meisburger, Roger Fabian Pease, Gil Winograd

Proceedings Volume 3777, (1999) https://doi.org/10.1117/12.370130

KEYWORDS: Monte Carlo methods, Magnetism, Charged-particle lithography, Projection systems, Monochromatic aberrations, Polonium, Argon, Electron beam lithography, Stochastic processes, Lithography

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Proceedings Article | 22 May 1995 Paper

Characterization of a new automated electron-beam wafer inspection system

Douglas Hendricks, Jack Jau, Hans Dohse, Alan Brodie, William Meisburger

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209200

KEYWORDS: Inspection, Semiconducting wafers, Imaging systems, Wafer inspection, Scanning electron microscopy, Optical inspection, Metals, Defect detection, Wafer-level optics, Computing systems

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Conference Committee Involvement (1)

Charged Particle Beam Optics Imaging

30 July 2001 | San Diego, CA, United States

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