Dr. David R. Medeiros
at IBM Corp
SPIE Involvement:
Author
Publications (32)

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 69243C (2008) https://doi.org/10.1117/12.784107
KEYWORDS: Photomasks, Double patterning technology, Logic, Lithography, Etching, Optical lithography, Optical proximity correction, Immersion lithography, Printing, Image processing

Proceedings Article | 26 March 2008 Paper
Dario Goldfarb, Sean Burns, Libor Vyklicky, Dirk Pfeiffer, Anthony Lisi, Karen Petrillo, John Arnold, Daniel Sanders, Aleksandra Clancy, Robert Lang, Robert Allen, David Medeiros, Dah Chung Owe-Yang, Kazumi Noda, Seiichiro Tachibana, Shozo Shirai
Proceedings Volume 6923, 69230V (2008) https://doi.org/10.1117/12.772268
KEYWORDS: Reflectivity, Polymers, Photoresist materials, Silicon, Etching, Lithography, Optical lithography, Interfaces, Multilayers, Semiconducting wafers

Proceedings Article | 26 March 2008 Paper
Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Harry Levinson, Sarah McGowan, Uzodinma Okoroanyanwu, Rolf Seltmann, Cyrus Tabery, Anna Tchikoulaeva, Tom Wallow, Obert Wood, John Arnold, Don Canaperi, Matthew Colburn, Kurt Kimmel, Chiew-Seng Koay, Erin Mclellan, Dave Medeiros, Satyavolu Papa Rao, Karen Petrillo, Yunpeng Yin, Hiroyuki Mizuno, Sander Bouten, Michael Crouse, Andre van Dijk, Youri van Dommelen, Judy Galloway, Sang-In Han, Bart Kessels, Brian Lee, Sjoerd Lok, Brian Niekrewicz, Bill Pierson, Robert Routh, Emil Schmit-Weaver, Kevin Cummings, James Word
Proceedings Volume 6921, 69210P (2008) https://doi.org/10.1117/12.772933
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Transistors, Extreme ultraviolet, Optical proximity correction, Photoresist processing, Etching, Metals, Scanners

Proceedings Article | 29 March 2006 Paper
Sean Burns, Dirk Pfeiffer, Arpan Mahorowala, Karen Petrillo, Alexandera Clancy, Katherina Babich, David Medeiros, Scott Allen, Steven Holmes, Michael Crouse, Colin Brodsky, Victor Pham, Yi-Hsiung Lin, Kaushal Patel, Naftali Lustig, Allen Gabor, Christopher Sheraw, Phillip Brock, Carl Larson
Proceedings Volume 6153, 61530K (2006) https://doi.org/10.1117/12.657197
KEYWORDS: Silicon, Reflectivity, Etching, Photoresist materials, Polymers, Lithography, Oxides, Silicon films, Reactive ion etching, Optical lithography

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601759
KEYWORDS: Diffusion, Absorption, Photoresist materials, Polymers, Humidity, Lithography, Extreme ultraviolet lithography, Image resolution, Infrared imaging, Photoresist processing

Proceedings Article | 14 May 2004 Paper
Kaushal Patel, Margaret Lawson, Pushkara Rao Varanasi, David Medeiros, Gregory Wallraff, Phillip Brock, Richard DiPietro, Yukio Nishimura, Takashi Chiba, Mark Slezak
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536874
KEYWORDS: Polymers, Etching, Photoresist processing, Lithography, 193nm lithography, Printing, Oxides, Standards development, Resistance, Fluorine

Proceedings Article | 14 May 2004 Paper
William Hinsberg, Gregory Wallraff, Carl Larson, Blake Davis, Vaughn Deline, Simone Raoux, Dolores Miller, Frances Houle, John Hoffnagle, Martha Sanchez, Charles Rettner, Linda Sundberg, David Medeiros, Ralph Dammel, Willard Conley
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536576
KEYWORDS: Liquids, Polymers, Diffusion, Lithography, Immersion lithography, Polymer thin films, Imaging systems, Neodymium, Semiconducting wafers, Absorption

Proceedings Article | 28 August 2003 Paper
Wu-Song Huang, Wei He, Wenjie Li, Wayne Moreau, Robert Lang, David Medeiros, Karen Petrillo, Arpan Mahorowala, Marie Angelopoulos, Christina Deverich, Chester Huang, Paul Rabidoux
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504049
KEYWORDS: Etching, Photomasks, Polymers, Silicon, Chromium, Semiconducting wafers, Mask making, Resistance, Lithography, Scanning electron microscopy

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487739
KEYWORDS: Lithography, Image resolution, Polymers, Diffusion, Semiconductors, Photoresist processing, Image processing, Chemically amplified resists, Line edge roughness, Molecules

Proceedings Article | 12 June 2003 Paper
Dirk Pfeiffer, Arpan Mahorowala, Katherina Babich, David Medeiros, Karen Petrillo, Marie Angelopoulos, Wu-Song Huang, Scott Halle, Colin Brodsky, Scott Allen, Steven Holmes, Ranee Kwong, Robert Lang, Phillip Brock
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485178
KEYWORDS: Silicon, Etching, Lithography, Polymers, Oxides, Photoresist processing, Reflectivity, Silicon films, 193nm lithography, Bottom antireflective coatings

Proceedings Article | 12 June 2003 Paper
Katherina Babich, Arpan Mahorowala, David Medeiros, Dirk Pfeiffer, Karen Petrillo, Marie Angelopoulos, Alfred Grill, Vishnubhai Patel, Scott Halle, Timothy Brunner, Richard Conti, Scott Allen, Richard Wise
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485174
KEYWORDS: Etching, Silicon, Reflectivity, Lithography, Plasma, Interfaces, Photoresist processing, Electron beam lithography, Plasma enhanced chemical vapor deposition, Image resolution

Proceedings Article | 27 December 2002 Paper
Karen Petrillo, David Medeiros, Jim Bucchignano, Marie Angelopoulos, Dario Goldfarb, Wu-Song Huang, Wayne Moreau, Robert Lang, Chester Huang, Christina Deverich, Thomas Cardinali
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468085
KEYWORDS: Photomasks, Mask making, Photoresist materials, Chemically amplified resists, Semiconducting wafers, Polymers, Scanning electron microscopy, Electron beam lithography, Lithography, Oxides

Proceedings Article | 24 July 2002 Paper
Ranee Kwong, Mahmoud Khojasteh, Margaret Lawson, Timothy Hughes, Pushkara Varanasi, William Brunsvold, Robert Allen, Phillip Brock, Ratnam Sooriyakumaran, Hoa Truong, Arpan Mahorowala, David Medeiros
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474239
KEYWORDS: Silicon, Etching, Polymers, Lithography, Reactive ion etching, 193nm lithography, Photomasks, Manufacturing, Absorbance, Resistance

Proceedings Article | 24 July 2002 Paper
David Medeiros, Karen Petrillo, Gregory Breyta, Wu-Song Huang, Wayne Moreau
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474243
KEYWORDS: Polymers, Electron beams, Quantum efficiency, Polymethylmethacrylate, Image processing, Photoresist processing, Etching, Semiconducting wafers, Absorption, Resolution enhancement technologies

Proceedings Article | 24 July 2002 Paper
Wu-Song Huang, Ranee Kwong, Wayne Moreau, Robert Lang, David Medeiros, Karen Petrillo, Arpan Mahorowala, Marie Angelopoulos, Qinghuang Lin, Junyan Dai, Christopher Ober
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474242
KEYWORDS: Etching, Polymers, Silicon, Lithography, Resistance, Mask making, Polymer thin films, Atomic force microscopy, Surface roughness, Chromium

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474230
KEYWORDS: Humidity, Photoresist materials, Nitrogen, FT-IR spectroscopy, Semiconducting wafers, Chemically amplified resists, Environmental monitoring, Polymers, Switching, Spectroscopy

Proceedings Article | 24 July 2002 Paper
Gregory Wallraff, Carl Larson, Nicolette Fender, Blake Davis, David Medeiros, Jeff Meute, William Lamanna, Mike Parent, T. Robeledo, Gregory Young
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474215
KEYWORDS: Polymers, Diffusion, Polymer thin films, Semiconducting wafers, Photoresist materials, Silicon, Temperature metrology, Absorbance, Laser phosphor displays, Chemically amplified resists

Proceedings Article | 11 March 2002 Paper
David Medeiros, Karen Petrillo, James Bucchignano, Marie Angelopoulos, Wu-Song Huang, Wenjie Li, Wayne Moreau, Robert Lang, Ranee Kwong, Christopher Magg, Brian Ashe
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458334
KEYWORDS: Etching, Photomasks, Resistance, Mask making, Lithography, Polymers, Scanning electron microscopy, Packaging, Plasma, Electron beam lithography

Proceedings Article | 11 March 2002 Paper
Brian Ashe, Christina Deverich, Paul Rabidoux, Barbara Peck, Karen Petrillo, Marie Angelopoulos, Wu-Song Huang, Wayne Moreau, David Medeiros
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458348
KEYWORDS: Etching, Chemically amplified resists, Mask making, Photoresist processing, Optics manufacturing, Photomasks, Critical dimension metrology, Resistance, Reactive ion etching, Dry etching

Proceedings Article | 5 September 2001 Paper
Wu-Song Huang, Ranee Kwong, Wayne Moreau, Robert Lang, Christopher Robinson, David Medeiros, Karen Petrillo, Ari Aviram, Arpan Mahorowala, Marie Angelopoulos, Christopher Magg, Mark Lawliss, Thomas Faure
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438350
KEYWORDS: Etching, Silicon, Resistance, Mask making, Dry etching, Lithography, Photoresist processing, Chromium, Photomasks, Image resolution

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436853
KEYWORDS: Electron beam lithography, Electron beams, Scanning electron microscopy, Deep ultraviolet, Semiconducting wafers, Photomicroscopy, Chemically amplified resists, Thin films, Silicon, Modulation

Proceedings Article | 24 August 2001 Paper
Benjamen Rathsack, Peter Tattersall, Cyrus Tabery, Kathleen Lou, Timothy Stachowiak, David Medeiros, Jeff Albelo, Peter Pirogovsky, Dennis McKean, C. Grant Willson
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436887
KEYWORDS: Picture Archiving and Communication System, Deep ultraviolet, Chromophores, Photoresist processing, Lithography, Absorbance, Molecules, Mask making, Photomasks, Hydrogen

Proceedings Article | 20 August 2001 Paper
Wu-Song Huang, Ranee Kwong, Wayne Moreau, Robert Lang, Christopher Robinson, David Medeiros, Karen Petrillo, Ari Aviram, Arpan Mahorowala, Marie Angelopoulos, Christopher Magg, Mark Lawliss, Thomas Faure
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436656
KEYWORDS: Etching, Silicon, Resistance, Photomasks, Mask making, Lithography, Dry etching, Photoresist processing, Chromium, Image resolution

Proceedings Article | 23 June 2000 Paper
Alexander Trimble, David Tully, Jean Frechet, David Medeiros, Marie Angelopoulos
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388286
KEYWORDS: Polymers, Chemically amplified resists, Electron beam lithography, Potassium, Semiconducting wafers, Lithography, Silicon, Chemistry, Photoresist developing, Carbonates

Proceedings Article | 11 June 1999 Paper
Qinghuang Lin, Karen Petrillo, Katherina Babich, Douglas LaTulipe, David Medeiros, Arpan Mahorowala, John Simons, Marie Angelopoulos, Gregory Wallraff, Carl Larson, Debra Fenzel-Alexander, Ratnam Sooriyakumaran, Gregory Breyta, Phillip Brock, Richard Di Pietro, Donald Hofer
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350207
KEYWORDS: Silicon, Etching, Polymers, Reactive ion etching, Lithography, Imaging systems, Resistance, Optical properties, Photomasks, Silicon films

Proceedings Article | 11 June 1999 Paper
Wu-Song Huang, Ranee Kwong, Wayne Moreau, Mark Chace, Kim Lee, C. Hu, David Medeiros, Marie Angelopoulos
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350156
KEYWORDS: Electron beam lithography, Copper, Polymers, Photoresist processing, FT-IR spectroscopy, Semiconducting wafers, Metals, Scanning electron microscopy, Resistance, Etching

Proceedings Article | 29 June 1998 Paper
Shintaro Yamada, David Medeiros, Kyle Patterson, Wei-Lun Jen, Timo Rager, Qinghuang Lin, Carlos Lenci, Jeff Byers, Jennifer Havard, Dario Pasini, Jean Frechet, C. Grant Willson
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312414
KEYWORDS: Polymers, Photoresist materials, Switches, Photoresist developing, Etching, Imaging systems, Resistance, Photoresist processing, Polymer thin films, Chromophores

Proceedings Article | 29 June 1998 Paper
Jennifer Havard, Dario Pasini, Jean Frechet, David Medeiros, Kyle Patterson, Shintaro Yamada, C. Grant Willson
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312351
KEYWORDS: Polymers, Carbonates, Chemistry, Molecules, Switches, Polymer thin films, Spectroscopy, Nitrogen, Chemical species, Standards development

Proceedings Article | 7 July 1997 Paper
Uzodinma Okoroanyanwu, Tsutomu Shimokawa, Jeff Byers, David Medeiros, C. Grant Willson, Qingshang Niu, Jean Frechet, Robert Allen
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275867
KEYWORDS: Polymers, Etching, Polymerization, Lithography, Photoresist materials, Resistance, Semiconducting wafers, Excimer lasers, Ultraviolet radiation, Optical lithography

Proceedings Article | 7 July 1997 Paper
Jennifer Havard, Jean Frechet, Dario Pasini, Brenda Mar, Shintaro Yamada, David Medeiros, C. Grant Willson
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275844
KEYWORDS: Coating, Polymers, Chemistry, Ultraviolet radiation, Photochemistry, Image processing, Electron beams, Imaging systems, Silicon, Semiconducting wafers

Proceedings Article | 14 June 1996 Paper
Roger Sinta, George Barclay, Timothy Adams, David Medeiros
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241822
KEYWORDS: Polymers, Glasses, Hydrogen, Deep ultraviolet, Annealing, Photoresist materials, Thermal effects, Temperature metrology, Chemically amplified resists, Carbonates

Proceedings Article | 1 June 1992 Paper
James Thackeray, Diane Canistro, Mark Denison, Joseph Ferrari, Richard Hemond, David Medeiros, George Orsula, Edward Pavelchek, Martha Rajaratnam, Roger Sinta
Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59722
KEYWORDS: Deep ultraviolet, Photoresist materials, Photoresist developing, Absorbance, Transparency, Chemically amplified resists, Lithography, Temperature metrology, Excimer lasers, Industrial chemicals

Showing 5 of 32 publications
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