Dr. David N. Woolf Profile

Dr. David N. Woolf

Group Leader, Structured Optical Materials at Physical Sciences Inc

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Publications (6)

Proceedings Article | 7 June 2024 Poster + Paper

Comparison of nano holes and nano pillars moth eye structures for mid-wave infrared

Rachit Sood, Chaoran Tu, Joel Hensley, Douglas Bamford, David Woolf, Narsingh Singh, Curtis Menyuk, Fow-Sen Choa

Proceedings Volume 13030, 130300H (2024) https://doi.org/10.1117/12.3013933

KEYWORDS: Eye, Gallium arsenide, Scanning electron microscopy, Mid infrared, Reflection, Solar cells, Contamination, Refractive index, Lithography, Fabrication

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Proceedings Article | 14 September 2023 Paper

Design and performance validation of a large diameter (22.5 mm) metalens refractive doublet

Nicholas Kochan, Evan Simmons, Wesley Britton, David Woolf

Proceedings Volume 12798, 1279802 (2023) https://doi.org/10.1117/12.2691488

KEYWORDS: Design and modelling, Lens design, Optical design, Metalenses, Commercial off the shelf technology, Wavefronts, Optics manufacturing, Near field optics, Manufacturing, Flat optics

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Proceedings Article | 5 August 2021 Presentation

Switchable thin-film filters enabled by the phase transition of vanadium dioxide

Chenghao Wan, David Woolf, Colin Hessel, Jad Salman, Yuzhe Xiao, Albert Wright, Joel Hensley, Mikhail Kats

Proceedings Volume 11796, 117961X (2021) https://doi.org/10.1117/12.2594032

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Proceedings Article | 28 February 2020 Paper

Design and fabrication of nanostructure for mid-IR antireflection surface texturing applications

Rachit Sood, Fatima Nafisa, Douglas Bamford, David Woolf, Joel Hensley, Narsingh Singh, Fow-Sen Choa

Proceedings Volume 11292, 112921F (2020) https://doi.org/10.1117/12.2548392

KEYWORDS: Semiconducting wafers, Gallium arsenide, Photoresist materials, Nanolithography, Photomasks, Etching, Computer aided design, Photoresist developing, Nanostructures, Scanning electron microscopy

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Proceedings Article | 31 January 2020 Paper

Reproducible array image translation and recreation in nano photolithography

Rachit Sood, Chaoran Tu, Douglas Bamford, Joel Hensley, David Woolf, C. Menyuk, Fow-Sen Choa

Proceedings Volume 11288, 1128824 (2020) https://doi.org/10.1117/12.2550387

KEYWORDS: Photomasks, Optical lithography, Fourier transforms, Antireflective coatings, Lithography, Nanolithography, Photoresist materials, Near field diffraction, Ultraviolet radiation, Gallium arsenide

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Showing 5 of 6 publications

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