Dr. Davide Dattilo Profile

Dr. Davide Dattilo

at Süss MicroTec Photomask Equipment GmbH & Co KG

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Author

Publications (9)

SPIE Journal Paper | 21 June 2023

Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber

Devesh Thakare, Meiyi Wu, Karl Opsomer, Qais Saadeh, Victor Soltwisch, Philipp Naujok, Christophe Detavernier, Davide Dattilo, Markus Foltin, Andy Goodyear, Mike Cooke, Annelies Delabie, Vicky Philipsen

JM3, Vol. 22, Issue 02, 024403, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.024403

KEYWORDS: Alloys, Extreme ultraviolet, Tantalum, Nanoimprint lithography, Etching, Oxides, Silicon, Ruthenium, Light sources and illumination, Film thickness

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Proceedings Article | 3 October 2018 Presentation + Paper

Advancements in pellicle glue residue removal

Davide Dattilo, Sebastian Dietze, Martin Samayoa, Uwe Dietze, Victoria Dahl, Zhenxing Han

Proceedings Volume 10810, 108100R (2018) https://doi.org/10.1117/12.2503937

KEYWORDS: Pellicles, Inspection, Scanning probe microscopy, Photomasks, Optical inspection, Reticles, Chemistry, Visualization, Polymers, Particles

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Proceedings Article | 20 October 2016 Paper

Towards expanding megasonic cleaning capability

Zhenxing Han, Berthold Ferstl, Günter Oetter, Uwe Dietze, Martin Samayoa, Davide Dattilo

Proceedings Volume 10032, 1003207 (2016) https://doi.org/10.1117/12.2248594

KEYWORDS: Particles, Cavitation, Acoustics, Acoustic cavitation, Photomasks, Photons, Chemistry, Transducers, Extreme ultraviolet, Sonoluminescence

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Proceedings Article | 23 October 2015 Paper

Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening

Jaehyuck Choi, Jinsu Kim, Jeff Lowe, Davide Dattilo, Soowan Koh, Jun Yeol Choi, Uwe Dietze, Tsutomu Shoki, Byung Gook Kim, Chan-Uk Jeon

Proceedings Volume 9635, 96350C (2015) https://doi.org/10.1117/12.2197226

KEYWORDS: Extreme ultraviolet, Carbon, Photomasks, Extreme ultraviolet lithography, Ruthenium, Industrial chemicals, Particles, Scanning probe microscopy, Mask cleaning, Pellicles

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EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage.

SPM (Sulfuric acid peroxide mixture) which has been extensively used for acid cleaning of photomask and wafer has serious drawback for EUV mask cleaning. It shows severe film loss of tantalum-based absorber layers and limited removal efficiency of EUV-generated carbon contaminants on EUV mask surface.

Here, we introduce such novel cleaning chemicals developed for EUV mask as almost film loss free for various layers of the mask and superior carbon removal performance. Combinatorial chemical screening methods allowed us to screen several hundred combinations of various chemistries and additives under several different process conditions of temperature and time, eventually leading to development of the best chemistry selections for EUV mask cleaning.

Recently, there have been many activities for the development of EUV pellicle, driven by ASML and core EUV scanner customer companies. It is still important to obtain film-loss free cleaning chemicals because cleaning cycle of EUV mask should be much faster than that of optic mask mainly due to EUV pellicle lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process.

We have investigated EUV mask quality changes and film losses during 50 cleaning cycles using new chemicals as well as particle and carbon contaminant removal characteristics. We have observed that the performance of new chemicals developed is superior to current SPM or relevant cleaning chemicals for EUV mask cleaning and EUV mask lifetime elongation.

Proceedings Article | 23 October 2015 Paper

Ruthenium capping layer preservation for 100X clean through pH driven effects

Davide Dattilo, Uwe Dietze, Jyh-Wei Hsu

Proceedings Volume 9635, 96351B (2015) https://doi.org/10.1117/12.2202188

KEYWORDS: Oxidation, Ruthenium, Metals, Extreme ultraviolet, Silicon, Ions, Scanning electron microscopy, Photomasks, Oxygen, Ozone

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Proceedings Article | 28 July 2014 Paper

Efficient ozone, sulfate, and ammonium free resist stripping process

Davide Dattilo, Uwe Dietze

Proceedings Volume 9256, 925604 (2014) https://doi.org/10.1117/12.2070808

KEYWORDS: Photomasks, Oxygen, Ozone, Photoresist processing, Ultraviolet radiation, Ions, Neodymium, Cavitation, Image processing, Air contamination

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Proceedings Article | 3 October 2013 Paper

Investigation of EUVL reticle capping layer peeling under wet cleaning

Sherjang Singh, Davide Dattilo, Uwe Dietze, Arun Kadaksham, Il-Yong Jang, Frank Goodwin

Proceedings Volume 8880, 888010 (2013) https://doi.org/10.1117/12.2031430

KEYWORDS: Lamps, Photomasks, Extreme ultraviolet lithography, Ruthenium, Oxygen, Mercury, Reticles, Semiconducting wafers, Reflectivity, Ultraviolet radiation

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Proceedings Article | 26 October 2004 Paper

Advances in photoconductive and photorefractive cyclometalated complexes development

Attilio Golemme, Iolinda Aiello, Davide Dattilo, D. Pucci, Mauro Ghedini, M. Talarico, Roberto Termine

Proceedings Volume 5521, (2004) https://doi.org/10.1117/12.557180

KEYWORDS: Crystals, Modulation, Refractive index, Polymers, Liquid crystals, Glasses, Birefringence, Polarization, Diffraction, Anisotropy

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Proceedings Article | 13 June 2002 Paper

Advances in organic photorefractive materials development

Attilio Golemme, Iolinda Aiello, Davide Dattilo, Mauro Ghedini, Alain Bruno, Roberto Termine

Proceedings Volume 4642, (2002) https://doi.org/10.1117/12.470456

KEYWORDS: Modulation, Refractive index, Data modeling, Phase shift keying, Polarization, Diffraction, Statistical modeling, Organic materials, Molecules, Crystals

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Showing 5 of 9 publications

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