Dr. Dominic J. Gnieser Profile

Dr. Dominic J. Gnieser

at Physikalisch-Technische Bundesanstalt

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Publications (7)

Proceedings Article | 3 April 2010 Paper

Monte Carlo modeling of BSE reflection in e-beam writers

H. Alves, K.-P. Johnsen, P. Hahmann, D. Gnieser, C. Frase, H. Bosse

Proceedings Volume 7637, 76371T (2010) https://doi.org/10.1117/12.846517

KEYWORDS: Reflection, Silicon, Teeth, Monte Carlo methods, Semiconducting wafers, Electron beams, Sensors, Objectives, Lithography, Critical dimension metrology

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Proceedings Article | 2 April 2010 Paper

SEM image modeling using the modular Monte Carlo model MCSEM

K.-P. Johnsen, C. Frase, H. Bosse, D. Gnieser

Proceedings Volume 7638, 76381O (2010) https://doi.org/10.1117/12.846543

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Chromium, 3D modeling, Sensors, Silica, Scattering, Image acquisition, Electron beams, Photomasks

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Proceedings Article | 27 May 2009 Paper

SEM image contrast modeling for mask and wafer metrology

C. Frase, D. Gnieser, K.-P. Johnsen, W. Häßler-Grohne, R. Tutsch, H. Bosse

Proceedings Volume 7470, 74700M (2009) https://doi.org/10.1117/12.835184

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Photomasks, Scattering, 3D modeling, Semiconducting wafers, Metrology, Optical simulations, Electron beams, Sensors

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Proceedings Article | 18 March 2009 Paper

Optimization of BSE-detector for e-beam direct write lithography

H. Alves, P. Hahmann, M. Slodowski, C. Frase, D. Gnieser, Klaus-Peter Johnsen, H. Bosse

Proceedings Volume 7271, 72712O (2009) https://doi.org/10.1117/12.814156

KEYWORDS: Sensors, Signal to noise ratio, Monte Carlo methods, Signal detection, Lithography, Etching, Scattering, Electron beams, Direct write lithography, Vestigial sideband modulation

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Proceedings Article | 2 May 2008 Paper

Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node

W. Häßler-Grohne, C. Frase, D. Gnieser, H. Bosse, J. Richter, A. Wiswesser

Proceedings Volume 6792, 67920O (2008) https://doi.org/10.1117/12.798783

KEYWORDS: Photomasks, Scanning electron microscopy, Critical dimension metrology, Electrons, Monte Carlo methods, Calibration, Metrology, Silicon, Diffusion, Line edge roughness

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Proceedings Article | 26 March 2008 Paper

E-beam direct write alignment strategies for the next generation node

H. Alves, P. Hahmann, K.-H. Kliem, U. Weidenmueller, S. Jahr, C. Frase, D. Gnieser, H. Bosse, R. Zimmermann, C. Arndt

Proceedings Volume 6921, 69210I (2008) https://doi.org/10.1117/12.771585

KEYWORDS: Optical alignment, Monte Carlo methods, Sensors, Silicon, Signal to noise ratio, Signal detection, Semiconducting wafers, Vestigial sideband modulation, Electron beam direct write lithography, Lithography

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Proceedings Article | 5 April 2007 Paper

A new SEM CD operator verified against Monte Carlo simulations

C. Frase, D. Gnieser, K. Dirscherl, E. Buhr, H. Bosse

Proceedings Volume 6518, 65184P (2007) https://doi.org/10.1117/12.712503

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Critical dimension metrology, Computer simulations, Image acquisition, Scattering, Optical simulations, Electron beams, Convolution, Metrology

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Showing 5 of 7 publications

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