Dr. Frank Bornebroek Profile

Dr. Frank Bornebroek

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 28 April 2023 Presentation + Paper

0.33 NA EUV systems for high volume manufacturing

Christophe Smeets, Nico Benders, Frank Bornebroek, Joe Carbone, Roderik van Es, Arthur Minnaert, Guido Salmaso, Stuart Young

Proceedings Volume 12494, 1249406 (2023) https://doi.org/10.1117/12.2658046

KEYWORDS: Extreme ultraviolet, High volume manufacturing, Semiconducting wafers, Carbon, Wavefront errors, Wavefront aberrations, Semiconductors, Scanners

Read Abstract +

Proceedings Article | 22 February 2021 Presentation

0.33 NA EUV systems for high-volume manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie Van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Klaus Hummler, Roderik Van Es

Proceedings Volume 11609, 1160908 (2021) https://doi.org/10.1117/12.2583992

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Stochastic processes, Scanners, Overlay metrology, Logic, Lithography, Critical dimension metrology

Read Abstract +

Proceedings Article | 22 September 2020 Presentation

0.33 NA EUV systems for High Volume Manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Martijn Leenders, Roderik van Es

Proceedings Volume 11517, 1151703 (2020) https://doi.org/10.1117/12.2572356

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Logic devices, Manufacturing, Scanners, Lithography, Logic, Overlay metrology, Critical dimension metrology, Stochastic processes

Read Abstract +

Proceedings Article | 14 March 2019 Presentation

High-NA EUV lithography exposure tool progress

Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Paul Graeupner, Joerg Zimmermann, Peter Kuerz, Marco Pieters, Winfried Kaiser

Proceedings Volume 10957, 1095707 (2019) https://doi.org/10.1117/12.2515205

KEYWORDS: Extreme ultraviolet lithography, High volume manufacturing, Scanners, Lens design, Sensors, Polarization, Polarization control

Read Abstract +

Proceedings Article | 12 October 2018 Presentation

High-NA EUV lithography exposure tool progress (Conference Presentation)

Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Hans Meiling, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Erik Loopstra, Bernhard Kneer, Sascha Migura

Proceedings Volume 10809, 108090Z (2018) https://doi.org/10.1117/12.2502894

KEYWORDS: Extreme ultraviolet lithography, High volume manufacturing, Scanners, Lens design, Sensors, Polarization, Polarization control

Read Abstract +

Proceedings Article | 19 March 2018 Presentation

The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura

Proceedings Volume 10583, 105830R (2018) https://doi.org/10.1117/12.2295800

KEYWORDS: Extreme ultraviolet lithography, Scanners, Imaging systems, Manufacturing, Lens design, Sensors, Optical proximity correction, Modeling, Photomasks, Lithography

Read Abstract +

Proceedings Article | 16 October 2017 Presentation + Paper

High-NA EUV lithography enabling Moore’s law in the next decade

Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura, Jens Timo Neumann

Proceedings Volume 10450, 104500U (2017) https://doi.org/10.1117/12.2280592

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Mirrors, Reticles, Projection systems, Optical design, Imaging systems, Extreme ultraviolet

Read Abstract +

Proceedings Article | 18 March 2015 Paper

Immersion and dry scanner extensions for sub-10nm production nodes

Stefan Weichselbaum, Frank Bornebroek, Toine de Kort, Richard Droste, Roelof de Graaf, Rob van Ballegoij, Herman Botter, Matthew McLaren, Wim de Boeij

Proceedings Volume 9426, 942616 (2015) https://doi.org/10.1117/12.2087112

KEYWORDS: Semiconducting wafers, Scanners, Reticles, Imaging systems, Neodymium, Calibration, Metrology, Lithography, Optical lithography, Overlay metrology

Read Abstract +

Proceedings Article | 23 March 2012 Paper

From performance validation to volume introduction of ASML's NXE platform

Hans Meiling, Wim de Boeij, Frank Bornebroek, Noreen Harned, Ivo de Jong, Peter Kűrz, Martin Lowisch, Henk Meijer, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Christian Wagner, Stuart Young, Ron Kool

Proceedings Volume 8322, 83221G (2012) https://doi.org/10.1117/12.916971

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Scanners, Mirrors, Photomasks, Particles, Overlay metrology, Line width roughness

Read Abstract +

Proceedings Article | 4 March 2010 Paper

Advanced imaging with 1.35 NA immersion systems for volume production

Igor Bouchoms, Jan Mulkens, Sander de Putter, Pieter Gunter, Roelof de Graaf, Marcel Beems, Erwin Verdurmen, Hans Jasper, Nils Dieckmann, Frank Bornebroek

Proceedings Volume 7640, 76401R (2010) https://doi.org/10.1117/12.845597

KEYWORDS: Semiconducting wafers, Reticles, Scanners, Control systems, Imaging systems, Critical dimension metrology, Logic, Overlay metrology, Wavefronts, Optical alignment

Read Abstract +

Proceedings Article | 17 March 2009 Paper

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Jo Finders, Mircea Dusa, Bert Vleeming, Timon Fliervoet, Birgitt Hepp, Henry Megens, Remco Groenendijk, John Quaedackers, Evert Mos, Christian Leewis, Frank Bornebroek, Mireille Maenhoudt, Marc Leblans, Tom Vandeweyer, Gayle Murdoch, Efrain Altamirano Sanchez

Proceedings Volume 7274, 72740R (2009) https://doi.org/10.1117/12.814091

KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Metrology, Scatterometry, Scanning electron microscopy, Scanners, Process control, Lithography, Optical lithography

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Cost-effective shrink of semi-critical layers using the TWINSCAN XT:1000H NA 0.93 KrF scanner

Frank Bornebroek, Marten de Wit, Wim de Boeij, Gerald Dicker, Jongkyun Hong, Alexander Serebryakov

Proceedings Volume 7274, 72743I (2009) https://doi.org/10.1117/12.816521

KEYWORDS: Semiconducting wafers, Scanners, Metals, Photomasks, Lithography, Lithographic illumination, Printing, Optical proximity correction, High volume manufacturing, Overlay metrology

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner

Wim de Boeij, Gerald Dicker, Marten de Wit, Frank Bornebroek, Mark Zellenrath, Harm-Jan Voorma, Bart Smeets, Rene Toussaint, Bart Paarhuis, Marteijn de Jong, Dirk Hellweg, Klaus Kornitzer

Proceedings Volume 7140, 71401B (2008) https://doi.org/10.1117/12.805381

KEYWORDS: Semiconducting wafers, Scanners, Fiber optic illuminators, Lithography, Imaging systems, Overlay metrology, Polarization, Monochromatic aberrations, Reticles, Optical design

Read Abstract +

Proceedings Article | 19 March 2008 Paper

Yield aware design of gate layer for 45 nm CMOS-ASIC using a high-NA dry KrF systems

Ewoud Vreugdenhil, Harold Benten, Liesbeth Reijnen, Gerald Dicker, Jan-Willem Gemmink, Frank Bornebroek

Proceedings Volume 6925, 69250D (2008) https://doi.org/10.1117/12.771998

KEYWORDS: Photomasks, Optical lithography, Nanoimprint lithography, Transistors, Lithography, Curium, Printing, Field effect transistors, Scanners, Semiconducting wafers

Read Abstract +

Proceedings Article | 16 July 2002 Paper

Advances in process overlay: ATHENA alignment system performance on critical process layers

David Laidler, Henry Megens, Sanjay Lalbahadoersing, Richard van Haren, Frank Bornebroek

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473478

KEYWORDS: Optical alignment, Chemical mechanical planarization, Semiconducting wafers, Oxides, Polishing, Metals, Signal processing, Overlay metrology, Copper, Dielectrics

Read Abstract +

Proceedings Article | 22 August 2001 Paper

Advances in process overlay

Paul Hinnen, Henry Megens, Maurits van der Schaar, Richard van Haren, Evert Mos, Sanjay Lalbahadoersing, Frank Bornebroek, David Laidler

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436734

KEYWORDS: Semiconducting wafers, Optical alignment, Copper, Overlay metrology, Metals, Metrology, Silicon, Aluminum, Chemical mechanical planarization, Polishing

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Overlay performance in advanced processes

Frank Bornebroek, Jaap Burghoorn, James Greeneich, Henry Megens, Danu Satriasaputra, Geert Simons, Sunny Stalnaker, Bert Koek

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389040

KEYWORDS: Semiconducting wafers, Optical alignment, Overlay metrology, Sensors, Diffraction, Chemical mechanical planarization, Metals, Lithography, Polishing, Manufacturing

Read Abstract +

Proceedings Article | 26 July 1999 Paper

0.7-NA DUV step-and-scan system for 150-nm imaging with improved overlay

Jan van Schoot, Frank Bornebroek, Manfred Suddendorf, Melchior Mulder, Jeroen van der Spek, Jan Stoeten, Adolph Hunter, Peter Ruemmer

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354357

KEYWORDS: Semiconducting wafers, Optical alignment, Imaging systems, Distortion, Deep ultraviolet, Reticles, Monochromatic aberrations, Photoresist materials, Diffraction, Scanning electron microscopy

Read Abstract +

Proceedings Article | 14 June 1999 Paper

Improved wafer stepper alignment performance using an enhanced phase grating alignment system

Jaap Neijzen, Robert Morton, Peter Dirksen, Henry Megens, Frank Bornebroek

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350826

KEYWORDS: Optical alignment, Semiconducting wafers, Coating, Data transmission, Chemical mechanical planarization, Aluminum, Numerical simulations, Oxides, Diffraction, Spatial frequencies

Read Abstract +

Showing 5 of 19 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years