Dr. Friso Wittebrood Profile

Dr. Friso Wittebrood

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

Focus sensing using placement and CD variation for high NA EUV lithography

Victor Calado, Simon Mathijssen, Eelco van Setten, Jo Finders, Friso Wittebrood, Wim Bouman, Kaustuve Bhattacharyya, Willem op 't Root, Elliott McNamara, Matthew McLaren

Proceedings Volume 12953, 1295307 (2024) https://doi.org/10.1117/12.3010835

KEYWORDS: Semiconducting wafers, Personal protective equipment, Metrology, Logic, Scanning electron microscopy, Metals, Extreme ultraviolet lithography, Optical testing, Matrices, Image classification

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Proceedings Article | 21 November 2023 Presentation + Paper

Presentation + Paper

Stitching for high-NA: zooming in on CDU budget

Natalia Davydova, Lieve van Look, Ataklti Weldeslassie, Vincent Wiaux, Laura Huddleston, Bram Slachter, Nick Pellens, Frank Timmermans, Friso Wittebrood, Eelco van Setten, Daniel Wilson

Proceedings Volume 12750, 1275002 (2023) https://doi.org/10.1117/12.2687703

KEYWORDS: Critical dimension metrology, Zoom lenses, Reticles, Metrology, Image quality, Extreme ultraviolet, Stochastic processes, Statistical analysis, Semiconducting wafers, Overlay metrology

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Proceedings Article | 28 September 2021 Presentation

Presentation

High-NA EUV imaging: from system introduction towards low-k1 extension

Eelco van Setten, Jan Van Schoot, Anton van Oosten, Claire van Lare, Friso Wittebrood, Gijsbert Rispens, Gerardo Bottiglieri, John McNamara, Natalia Davydova, Jo Finders, Joerg Zimmermann, Bartosz Bilski, Paul Graeupner

Proceedings Volume 11854, 118540G (2021) https://doi.org/10.1117/12.2600965

KEYWORDS: Imaging systems, Extreme ultraviolet, Fiber optic illuminators, Transistors, Scanners, Optimization (mathematics), Mirrors, Metals, Extreme ultraviolet lithography

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Proceedings Article | 3 October 2018 Presentation + Paper

Presentation + Paper

NXE:3400B imaging performance assessed from a customer perspective

Friso Wittebrood, Guido Schiffelers, Colette Legein

Proceedings Volume 10809, 1080905 (2018) https://doi.org/10.1117/12.2503343

KEYWORDS: Metals, Optical lithography, Extreme ultraviolet lithography, Logic, Photomasks, Scanners, Double patterning technology, High volume manufacturing, Source mask optimization, Semiconducting wafers

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Proceedings Article | 28 September 2017 Paper

Paper

Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility

Bartosz Bilski, Ziyang Wang, Friso Wittebrood, John McNamara, Dorothe Oorschot, Mark van de Kerkhof, Timon Fliervoet

Proceedings Volume 10446, 1044605 (2017) https://doi.org/10.1117/12.2280379

KEYWORDS: Scanners, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Photomasks, Extreme ultraviolet, Diffraction, Semiconductors, Overlay metrology, Lithographic illumination, Image contrast enhancement

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Proceedings Article | 24 March 2017 Presentation + Paper

Presentation + Paper

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

Joost Bekaert, Paolo Di Lorenzo, Ming Mao, Stefan Decoster, Stéphane Larivière, Joern-Holger Franke, Victor M. Blanco Carballo, Bogumila Kutrzeba Kotowska, Frederic Lazzarino, Emily Gallagher, Eric Hendrickx, Philippe Leray, R. Ryoung-han Kim, Greg McIntyre, Paul Colsters, Friso Wittebrood, Joep van Dijk, Mark Maslow, Vadim Timoshkov, Ton Kiers

Proceedings Volume 10143, 101430H (2017) https://doi.org/10.1117/12.2258004

KEYWORDS: Optical lithography, Extreme ultraviolet, Back end of line, Metals, Logic, Extreme ultraviolet lithography, Etching, Double patterning technology, Lithography, Photomasks, Stochastic processes, System on a chip, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 24 March 2017 Presentation + Paper

Presentation + Paper

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

V. Blanco Carballo, J. Bekaert, M. Mao, B. Kutrzeba Kotowska, S. Larivière, I. Ciofi, R. Baert, R. H. Kim, E. Gallagher, E. Hendrickx, L. E. Tan, W. Gillijns, D. Trivkovic, P. Leray, S. Halder, M. Gallagher, F. Lazzarino, S. Paolillo, D. Wan, A. Mallik, Y. Sherazi, G. McIntyre, M. Dusa, P. Rusu, T. Hollink, T. Fliervoet, F. Wittebrood

Proceedings Volume 10143, 1014318 (2017) https://doi.org/10.1117/12.2258005

KEYWORDS: Metals, Extreme ultraviolet lithography, Optical lithography, Back end of line, Extreme ultraviolet, Etching, Semiconducting wafers, Logic, Critical dimension metrology, Tin

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Proceedings Article | 24 March 2017 Presentation + Paper

Presentation + Paper

N7 dark field two-bar in 0.33NA EUVL: Mitigation of CD Bossung tilts caused by strong coupling between the feature's primary and 1st self-image

T. Last, P. van Adrichem, L. de Winter, S. Hsu, J. Finders, F. Wittebrood, M. van de Kerkhof

Proceedings Volume 10143, 1014311 (2017) https://doi.org/10.1117/12.2257463

KEYWORDS: SRAF, Extreme ultraviolet lithography, Diffraction, Photomasks, Image enhancement, Logic, Source mask optimization, Critical dimension metrology, Image acquisition, 3D image processing, Lithographic illumination

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Proceedings Article | 26 April 2016 Paper

Paper

Contrast optimization for 0.33NA EUV lithography

Jo Finders, Sander Wuister, Thorsten Last, Gijsbert Rispens, Eleni Psari, Jan Lubkoll, Eelco van Setten, Friso Wittebrood

Proceedings Volume 9776, 97761P (2016) https://doi.org/10.1117/12.2220036

KEYWORDS: Nanoimprint lithography, Extreme ultraviolet lithography, Immersion lithography, Lithographic illumination, Extreme ultraviolet, Critical dimension metrology, Neodymium, Tantalum, Line width roughness, Semiconducting wafers

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Proceedings Article | 18 March 2016 Paper

Paper

Assist features: placement, impact, and relevance for EUV imaging

Iacopo Mochi, Vicky Philipsen, Emily Gallagher, Eric Hendrickx, Kateryna Lyakhova, Friso Wittebrood, Guido Schiffelers, Timon Fliervoet, Shibing Wang, Stephen Hsu, Vince Plachecki, Stan Baron, Bart Laenens

Proceedings Volume 9776, 97761S (2016) https://doi.org/10.1117/12.2220025

KEYWORDS: Neodymium, Photomasks, Semiconducting wafers, Extreme ultraviolet, Image processing, Lithography, Lithographic illumination, Extreme ultraviolet lithography, Optical proximity correction, Atrial fibrillation, Reticles, Printing, Deep ultraviolet

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Proceedings Article | 23 October 2015 Paper

Paper

Experimental validation of novel mask technology to reduce mask 3D effects

Lieve Van Look, Vicky Philipsen, Eric Hendrickx, Natalia Davydova, Friso Wittebrood, Robert de Kruif, Anton van Oosten, Junji Miyazaki, Timon Fliervoet, Jan van Schoot, Jens Timo Neumann

Proceedings Volume 9635, 96350Z (2015) https://doi.org/10.1117/12.2203124

KEYWORDS: Photomasks, Semiconducting wafers, Mirrors, Printing, Diffraction, Extreme ultraviolet, Prototyping, Nanoimprint lithography, 3D image processing, Inspection

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Proceedings Article | 4 September 2015 Paper

Paper

Patterning options for N7 logic: prospects and challenges for EUV

Eelco van Setten, Friso Wittebrood, Eleni Psara, Dorothe Oorschot, Vicky Philipsen

Proceedings Volume 9661, 96610G (2015) https://doi.org/10.1117/12.2196426

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Optical lithography, Semiconducting wafers, Logic, Etching, Error analysis, Liquid phase epitaxy, Lithography

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Proceedings Article | 4 September 2015 Paper

Paper

Experimental validation of novel EUV mask technology to reduce mask 3D effects

Lieve Van Look, Vicky Philipsen, Eric Hendrickx, Natalia Davydova, Friso Wittebrood, Robert de Kruif, Anton van Oosten, Junji Miyazaki, Timon Fliervoet, Jan van Schoot, Jens Timo Neumann

Proceedings Volume 9661, 966109 (2015) https://doi.org/10.1117/12.2195329

KEYWORDS: Photomasks, Semiconducting wafers, Mirrors, Printing, Extreme ultraviolet, Diffraction, Prototyping, Nanoimprint lithography, Inspection, 3D image processing

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Proceedings Article | 9 July 2015 Paper

Paper

Alternative EUV mask technology to compensate for mask 3D effects

Lieve Van Look, Vicky Philipsen, Eric Hendrickx, Geert Vandenberghe, Natalia Davydova, Friso Wittebrood, Robert de Kruif, Anton van Oosten, Junji Miyazaki, Timon Fliervoet, Jan van Schoot, Jens Timo Neumann

Proceedings Volume 9658, 96580I (2015) https://doi.org/10.1117/12.2197213

KEYWORDS: Photomasks, Semiconducting wafers, Mirrors, Printing, Extreme ultraviolet, Diffraction, Prototyping, Nanoimprint lithography, 3D image processing, Reflectivity

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Proceedings Article | 16 April 2012 Paper

Paper

NXE:3100 full wafer imaging performance and budget verification

Eelco van Setten, Koen van Ingen Schenau, Mark O'Mahony, Thijs Hollink, Friso Wittebrood, Natalia Davydova, Mark Eurlings, Kees Feenstra, Jo Finders, Mircea Dusa, Stuart Young

Proceedings Volume 8352, 835205 (2012) https://doi.org/10.1117/12.918495

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Imaging systems, Reticles, Extreme ultraviolet, Electroluminescence, Critical dimension metrology, Lithography, Scanning electron microscopy

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Showing 5 of 15 publications

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