Dr. Ge Cong Profile

Dr. Ge Cong

Research Engineer at KLA

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Publications (1)

Proceedings Article | 23 September 2009 Paper

SMO photomask inspection in the lithographic plane

Emily Gallagher, Karen Badger, Yutaka Kodera, Jaione Tirapu Azpiroz, Ioana Graur, Scott Halle, Kafai Lai, Gregory McIntyre, Mark Wihl, Shaoyun Chen, Ge Cong, Bo Mu, Zhian Guo, Aditya Dayal

Proceedings Volume 7488, 748807 (2009) https://doi.org/10.1117/12.830668

KEYWORDS: Photomasks, Inspection, Source mask optimization, Semiconducting wafers, Lithography, Manufacturing, Binary data, Reticles, Image processing, Image resolution

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