Mr. George Lippincott Profile

George Lippincott

Siemens Fellow at Siemens EDA

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 13 November 2024 Presentation

Monotonic machine learning for lithography retargeting layer generation by leveraging contour-based metrology

Yuansheng Ma, Haizhou Yin, Le Hong, Xuefeng Zeng, Xiaomei Li, Hongming Zhang, Jeongmi Lee, Xiaoyuan Qi, Neal Lafferty, Germain Fenger, George Lippincott, Jiechang Hou, Abdulrazaq Adams, Xima Zhang, Yuyang Sun, Danping Peng, Renyang Meng, Werner Gillijns

Proceedings Volume 13216, 132161V (2024) https://doi.org/10.1117/12.3034720

KEYWORDS: Etching, Machine learning, Metrology, Modeling, Semiconductor manufacturing, Data modeling, Contour extraction, Simulations, Scanning electron microscopy, Image processing

Read Abstract +

Proceedings Article | 10 April 2024 Presentation + Paper

Model-based OPC using the MEEF matrix III

Junjiang Lei, Yi Yang, George Lippincott, Xima Zhang

Proceedings Volume 12954, 1295418 (2024) https://doi.org/10.1117/12.3010562

KEYWORDS: Optical proximity correction, Photomasks, Matrices, Semiconducting wafers, Model based design, Histograms, Extreme ultraviolet, Electronic design automation

Read Abstract +

Proceedings Article | 10 April 2024 Presentation

An integrated verification flow for curvilinear mask

Shuling Wang, Shumay Shang, Sagar Saxena, Xima Zhang, George Lippincott, Le Hong, John Sturtevant

Proceedings Volume 12954, 1295415 (2024) https://doi.org/10.1117/12.3010925

KEYWORDS: Optical proximity correction, Lithography

Read Abstract +

Proceedings Article | 20 March 2018 Paper

Cross-MEEF assisted SRAF print avoidance approach

Vlad Liubich, William Brown, George Lippincott, Rui Wu

Proceedings Volume 10588, 105880T (2018) https://doi.org/10.1117/12.2297227

KEYWORDS: SRAF, Printing, Photovoltaics, Optical proximity correction, Photomasks, Model-based design, Detection and tracking algorithms, Lithography, Computer simulations, Optical lithography

Read Abstract +

Proceedings Article | 15 March 2016 Paper

A novel full chip process window OPC based on matrix retargeting

Xima Zhang, Zhitang Yu, Qingwei Liu, Xuan Shen, Liguo Zhang, Le Hong, Vlad Liubich, George Lippincott, Cynthia Zhu, James Word

Proceedings Volume 9780, 97801C (2016) https://doi.org/10.1117/12.2219913

KEYWORDS: Computer programming, Optical proximity correction, Resolution enhancement technologies, Metals, Computational lithography, Model-based design, Photomasks, Optical lithography, Lithography, Semiconducting wafers, Data modeling, Visualization

Read Abstract +

SPIE Journal Paper | 11 September 2015

Directed self-assembly graphoepitaxy template generation with immersion lithography

Yuansheng Ma, Junjiang Lei, J. Andres-Torres, Le Hong, James Word, Germain Fenger, Alexander Tritchkov, George Lippincott, Rachit Gupta, Neal Lafferty, Yuan He, Joost Bekaert, Geert Vanderberghe

JM3, Vol. 14, Issue 03, 031216, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031216

KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

Yuansheng Ma, Junjiang Lei, J. Torres, Le Hong, James Word, Germain Fenger, Alexander Tritchkov, George Lippincott, Rachit Gupta, Neal Lafferty, Yuan He, Joost Bekaert, Geert Vanderberghe

Proceedings Volume 9423, 942306 (2015) https://doi.org/10.1117/12.2085850

KEYWORDS: Photomasks, Optical proximity correction, Printing, Source mask optimization, Optical lithography, Neodymium, Visualization, Transmission electron microscopy, Dysprosium, Directed self assembly

Read Abstract +

Proceedings Article | 31 March 2014 Paper

Model-based OPC using the MEEF matrix II

Junjiang Lei, Le Hong, George Lippincott, James Word

Proceedings Volume 9052, 90520N (2014) https://doi.org/10.1117/12.2046635

KEYWORDS: Optical proximity correction, Photomasks, Feedback control, Semiconducting wafers, 3D modeling, Model-based design, Visualization, Computer simulations, Matrices, Convolution

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Flexible MRC rules for OPC

Nicolas Cobb, Eugene Miloslavsky, George Lippincott

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568420

KEYWORDS: Optical proximity correction, Feedback loops, Multilayers, Tolerancing, SRAF, Computer simulations, Visualization, Overlay metrology, Manufacturing, Resolution enhancement technologies

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years