George H. Seward
Principal Engineer at L-A-Omega Inc
SPIE Involvement:
Author | Instructor
Area of Expertise:
Lens design , Assembly tolerances , Opto-mechanical design , Alignment proceedures , Optical materials , Human vision
Websites:
Profile Summary

George Seward is a consultant in optical design. His instruments are known for easy assembly and consistent performance. Optical prescriptions are developed in Zemax. Fixtures are designed in solidworks. Fabrication is specified at vendors with proven track records. He is a graduate of Tufts University and a Howard Hughes Fellow.
Publications (5)

SPIE Press Book | 30 April 2010
KEYWORDS: Glasses, Monochromatic aberrations, Refractive index, Oxides, Silica, Objectives, Lead, Absorption, Sensors, Microscopes

SPIE Journal Paper | 1 September 2001
OE, Vol. 40, Issue 09, (September 2001) https://doi.org/10.1117/12.10.1117/1.1396656
KEYWORDS: Gaussian beams, Solids, Beam propagation method, Wave propagation, Radio propagation, Optical engineering, Wavefronts, Electromagnetism, Fourier transforms, Spatial frequencies

SPIE Journal Paper | 1 January 1999
George Seward, Pamela Cort
OE, Vol. 38, Issue 01, (January 1999) https://doi.org/10.1117/12.10.1117/1.602077
KEYWORDS: Reflectivity, Retroreflectors, Solids, Sensors, Polarization, Optical spheres, Refraction, Deconvolution, Mirrors, Reflectors

SPIE Journal Paper | 1 February 1998
OE, Vol. 37, Issue 02, (February 1998) https://doi.org/10.1117/12.10.1117/1.601872
KEYWORDS: Sensors, Modulation transfer functions, Optical transfer functions, Solids, Imaging systems, Radiometry, Spatial resolution, Image resolution, Optical engineering, Artificial intelligence

SPIE Journal Paper | 1 May 1997
George Seward, John Leszcynski, Edward Mulhern
OE, Vol. 36, Issue 05, (May 1997) https://doi.org/10.1117/12.10.1117/1.601335
KEYWORDS: Optical alignment, Mirrors, Sensors, Actuators, Alignment procedures, Laser marking, Laser systems engineering, Iris recognition, Semiconductor lasers, Laser drilling

Course Instructor
SC1051: Fundamentals of Microscope Design
This course will cover the optical engineering principles necessary to understand the working principles of microscopes and to develop a design suited to your own application. The basic components common to any microscope are defined. Seidel and chromatic aberrations which determine image quality are reviewed. The composition of the glass elements are related to chromatic aberrations. The contrast sensitivity function of human vision as it relates to microscopy is described. The effects of numerical aperture (NA) are described in terms of diffraction and lateral coherence. The numerous definitions of Nelson, Critical, and Kohler illumination are resolved by reference to the original designs of the 1890s. Edge sharpening by the use of critical illumination is described.
SC865: Microscope Design
This course will cover the optical engineering principles necessary to understand the working principles of microscopes and to develop a design suited to your own application. Fundamental concepts in optics relating to microscopes will be reviewed: paraxial optics, stops, wave-optics, depth-of-focus, illumination, and the important parameters of CCD sensors. Effects of optical aberrations upon image contrast will be quantified. Mathematical expressions for practical application will be provided for future reference.
SC253: Pixel Based Radiometry for Practical Application to Optical Systems
This course provides the student with fundamental knowledge required for modeling the image contrast of an optical system. Expressions are developed for practical application. Competing sources of light are modeled with the following origins: the object of interest, the background scene, and the collection path of the optics. Noise originating from the detector is modeled as another source of light. Optical systems are modeled by measurable parameters. Methods for maximizing contrast are discussed.
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