Mr. Gordon Russell Profile

Gordon Russell

at Siemens Industry Software Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 13 July 2017 Paper

Cycle time reduction by Html report in mask checking flow

Jian-Cheng Chen, Min-Ying Lu, Xiang Fang, Ming-Feng Shen, Shou-Yuan Ma, Chuen-Huei Yang, Joe Tsai, Rachel Lee, Erwin Deng, Ling-Chieh Lin, Hung-Yueh Liao, Jenny Tsai, Amanda Bowhill, Hien Vu, Gordon Russell

Proceedings Volume 10454, 104540G (2017) https://doi.org/10.1117/12.2278691

KEYWORDS: Reticles, Databases

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Proceedings Article | 10 May 2016 Paper

Production mask composition checking flow

Shou-Yuan Ma, Chuen-Huei Yang, Joe Tsai, Alice Wang, Roger Lin, Rachel Lee, Erwin Deng, Ling-Chieh Lin, Hung-Yueh Liao, Jenny Tsai, Amanda Bowhill, Hien Vu, Gordon Russell

Proceedings Volume 9984, 99840D (2016) https://doi.org/10.1117/12.2240292

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Data conversion, Acquisition tracking and pointing, Neodymium, Radon, Databases, Visualization, Etching

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Proceedings Article | 18 March 2015 Paper

Comparison of OPC job prioritization schemes to generate data for mask manufacturing

Travis Lewis, Vijay Veeraraghavan, Kenneth Jantzen, Stephen Kim, Minyoung Park, Gordon Russell, Mark Simmons

Proceedings Volume 9427, 942711 (2015) https://doi.org/10.1117/12.2086927

KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Data processing, Front end of line, Back end of line, Visualization, Design for manufacturability, Integrated circuits, Semiconductors

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Proceedings Article | 29 March 2011 Paper

Application of mask process correction (MPC) to monitor and correct mask process drift

Timothy Lin, Tom Donnelly, Gordon Russell, Sunwook Jung, Jiyoung Jeong

Proceedings Volume 7971, 797107 (2011) https://doi.org/10.1117/12.879119

KEYWORDS: Data modeling, Calibration, Photomasks, Critical dimension metrology, Process modeling, Manufacturing, Process control, Target detection, Feedback loops, Error analysis

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Proceedings Article | 26 March 2007 Paper

SRAF placement and sizing using inverse lithography technology

Timothy Lin, Frederic Robert, Amandine Borjon, Gordon Russell, Catherine Martinelli, Andrew Moore, Yves Rody

Proceedings Volume 6520, 65202A (2007) https://doi.org/10.1117/12.712369

KEYWORDS: SRAF, Photomasks, Manufacturing, Image quality, Lithography, Diffractive optical elements, Computer simulations, Lithographic illumination, Printing, Optical lithography

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Showing 5 of 6 publications

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