Mr. Graham Mueller Profile

Graham Mueller

at Siemens EDA

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Publications (1)

Proceedings Article | 26 May 2022 Paper

Virtual cross metrology: leveraging process sequence for improved process characterization

J. Andres Torres, Ivan Kissiov, Melody Tao, Graham Mueller, Stefan Schueler, Carsten Hartig, Richard Gardner, Srividya Jayaram

Proceedings Volume 12053, 120531B (2022) https://doi.org/10.1117/12.2614943

KEYWORDS: Process modeling, Process control, Metrology, Calibration, Semiconducting wafers, Neodymium, Error analysis, Control systems, Semiconductors, Machine learning

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