Mr. Gregg T. Borek Profile

Gregg T. Borek

Vice President Microoptics at JENOPTIK Optical Systems LLC

SPIE Involvement:

Author

Proceedings Article | 15 April 2008 Paper

Etching of chalcogenide glass for IR microoptics

John Smith, Gregg Borek

Proceedings Volume 6940, 69400W (2008) https://doi.org/10.1117/12.778748

KEYWORDS: Etching, Semiconducting wafers, Diffraction, Optical lithography, Plasma etching, Chalcogenide glass, Wafer-level optics, Infrared radiation, Optics manufacturing, Gallium arsenide

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Proceedings Article | 6 February 2008 Paper

Grayscale homogenizers in calcium fluoride

Jeffrey Lawrence, Lamarr Simmons, Andrew Stockham, John Smith, Gregg Borek, Matthias Cumme, Roman Kleindienst, Peter Weissbrodt

Proceedings Volume 6883, 68830O (2008) https://doi.org/10.1117/12.767531

KEYWORDS: Etching, Diffusers, Binary data, Microlens array, Semiconducting wafers, Calcium, Photoresist materials, Ions, Photomasks, Optics manufacturing

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Proceedings Article | 7 March 2007 Paper

Challenging micro-optical applications demand diverse manufacturing solutions

Gregg Borek, Peter Weissbrodt, Manfred Schrenk, Matthias Cumme

Proceedings Volume 6462, 64620X (2007) https://doi.org/10.1117/12.715022

KEYWORDS: Optics manufacturing, Optical components, Optical lithography, Near field optics, Micro optics, Manufacturing, Chemical elements, Lithography, Electron beam lithography, Photomasks

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Proceedings Article | 18 May 2005 Paper

Diffractively structured GaAs EOIR windows

Michael Wilson, Phillip Coulter, Jay Hammer, Gregg Borek

Proceedings Volume 5786, (2005) https://doi.org/10.1117/12.607454

KEYWORDS: Etching, Gallium arsenide, Semiconducting wafers, Photoresist materials, Atomic force microscopy, Reflectivity, Transmittance, Antireflective coatings, Thin film coatings, Photoresist developing

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Proceedings Article | 22 January 2005 Paper

Etching of micro- and nano-structures in semiconductor and glass material systems

Gregg Borek, Jared Shafer, Lamarr Simmons

Proceedings Volume 5720, (2005) https://doi.org/10.1117/12.600789

KEYWORDS: Etching, Semiconducting wafers, Glasses, Silicon carbide, Gallium nitride, Plasma etching, Gallium arsenide, Photoresist materials, Photomasks, Plasma

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Proceedings Article | 29 December 2003 Paper

Gray-scale fabrication of micro-optics in bulk zinc selenide and bulk multispectral zinc sulfide

Gregg Borek, Daniel Brown, Jared Shafer

Proceedings Volume 5347, (2003) https://doi.org/10.1117/12.524580

KEYWORDS: Zinc, Semiconducting wafers, Etching, Plasma etching, Optics manufacturing, Optical lithography, Wafer-level optics, Lenses, Aspheric lenses, Beam shaping

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Proceedings Article | 29 March 2000 Paper

Anamorphic lenses for laser diode circularization

Jeremiah Brown, Daniel Brown, Gregg Borek

Proceedings Volume 3945, (2000) https://doi.org/10.1117/12.380523

KEYWORDS: Semiconductor lasers, Photomasks, Microlens, Diodes, Tolerancing, Lenses, Lens design, Optical components, Microelectromechanical systems, Optical fabrication

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Proceedings Article | 1 June 1999 Paper

High-performance diffractive optics for beam shaping

Gregg Borek, David Brown

Proceedings Volume 3633, (1999) https://doi.org/10.1117/12.349341

KEYWORDS: Beam shaping, Diffraction, Near field optics, Etching, Analog electronics, Photomasks, Optical alignment, Photoresist materials, Lithography, Optics manufacturing

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Proceedings Article | 27 April 1999 Paper

Shearing-interferometer-based smart-pixel adaptive optics chip

Jay Hammer, Gregg Borek, Rodney Clark

Proceedings Volume 3649, (1999) https://doi.org/10.1117/12.347070

KEYWORDS: Mirrors, Sensors, Photodiodes, Wavefronts, Adaptive optics, Actuators, Integrated optics, Phase measurement, Optical amplifiers, Geometrical optics

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Proceedings Article | 12 April 1999 Paper

Diffractive color separation filter for high-efficiency LCD panels

Peter Erbach, Gregg Borek, David Brown, Thomas Gunn

Proceedings Volume 3636, (1999) https://doi.org/10.1117/12.344655

KEYWORDS: Optical filters, Signal to noise ratio, Cameras, CCD cameras, LCDs, Diffraction, Imaging systems, Neodymium, Optical fabrication, Charge-coupled devices

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Showing 5 of 10 publications

Conference Committee Involvement (7)

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III

25 January 2010 | San Francisco, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II

26 January 2009 | San Jose, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics

21 January 2008 | San Jose, California, United States

Micromachining Technology for Micro-optics and Nano-optics V

23 January 2007 | San Jose, California, United States

Micromachining Technology for Micro-Optics and Nano-Optics IV

23 January 2006 | San Jose, California, United States

Showing 5 of 7 Conference Committees

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