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Guangjian He
at Guangdong Greater Bay Area Institute of Integrated Circuit and Sy
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Publications (1)
Proceedings Article | 10 April 2024 Poster + Paper
A new stochastic EUV resist model based on a modified minimal process algorithm
Jing Xue, Guangjian He, Taian Fan, Yun Wang, Tianchun Ye, Yayi Wei
Proceedings Volume 12953, 1295314 (2024) https://doi.org/10.1117/12.3010234
KEYWORDS: Stochastic processes, Systems modeling, Diffusion, Monte Carlo methods, Photoresist materials, Computer simulations, Molecules, Extreme ultraviolet, Photoresist processing, Particles
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