CONFERENCE PROCEEDINGS
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Han-Byul Kang
at Photronics Inc
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Author
Publications (5)
SPIE Journal Paper | 1 January 2007
Control of chemical residue on photomasks using thermal treatment
Han-Byul Kang, Yong-Dae Kim, Jong-Min Kim, Hyun-Joon Cho, Moon-Hwan Choi, Sang-Soo Choi, Jee-Hwan Bae, Cheol-Woong Yang
JM3, Vol. 6, Issue 01, 013008, (January 2007) https://doi.org/10.1117/12.10.1117/1.2435715
KEYWORDS: Ions, Air contamination, Photomasks, Chromatography, Potassium, Phase shifts, Lithography, Thermal effects, Chemical analysis, Materials science
Proceedings Article | 8 November 2005 Paper
A study of organic contamination control on photomask surface for 65-nm tech node
Jong-Min Kim, Han-Byul Kang, Yong-Dae Kim, Hyun-Joon Cho, Sang-Soo Choi
Proceedings Volume 5992, 59923D (2005) https://doi.org/10.1117/12.631267
KEYWORDS: Air contamination, Photomasks, Natural surfaces, Chromium, Contamination control, Chemical analysis, Ions, Mask cleaning, Laser irradiation, Carbon
Proceedings Article | 28 June 2005 Paper
A study for the control of chemical residuals on photomasks by using a thermal treatment for 65-nm node
Han-Byul Kang, Jong-Min Kim, Yong-Dae Kim, Hyun-Joon Cho, Sang-Soo Choi
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617117
KEYWORDS: Air contamination, Ions, Photomasks, Humidity, Chromatography, Ultraviolet radiation, Semiconducting wafers, Chemical analysis, Manufacturing, 193nm lithography
Proceedings Article | 12 May 2005 Paper
The effect of polarized 193nm irradiation on photomask haze formation
Y. Kim, H. Kang, Yuan Zhang, Chuong Tran, Nigel Farrar, Jennifer Qin, Barry Rockwell, H. Cho, Rand Cottle, David Chan, Pat Martin, S. Choi, Chris Progler
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598913
KEYWORDS: Photomasks, Air contamination, Pellicles, Laser irradiation, Ions, Pulsed laser operation, Chromium, Chromatography, Inspection, Laser scanners
Proceedings Article | 10 May 2005 Paper
Effective control of photomask surface chemical residuals through thermal treatment
Han-Byul Kang, Jong-Min Kim, Yong-Dae Kim, Hyun-Joon Cho, Sang-Soo Choi
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599871
KEYWORDS: Ions, Photomasks, Air contamination, Chromatography, 193nm lithography, Thermal effects, Transmittance, Scanning probe microscopy, Semiconducting wafers, Lithography
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