Dr. Henry K. Yun Profile

Dr. Henry K. Yun

Engineer at SUNY Poly SEMATECH

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 20 March 2010 Paper

Particle removal challenges of EUV patterned masks for the sub-22nm HP node

Abbas Rastegar, Sean Eichenlaub, Arun John Kadaksham, Byunghoon Lee, Matt House, Sungmin Huh, Brian Cha, Henry Yun, Iacopo Mochi, Kenneth Goldberg

Proceedings Volume 7636, 76360N (2010) https://doi.org/10.1117/12.847056

KEYWORDS: Particles, Extreme ultraviolet, Photomasks, Silica, Ruthenium, Scanning electron microscopy, Reflectivity, Scanning probe microscopy, Vacuum ultraviolet, Inspection

Read Abstract +

Proceedings Article | 20 March 2010 Paper

EUV mask defect inspection and defect review strategies for EUV pilot line and high volume manufacturing

Y. David Chan, Abbas Rastegar, Henry Yun, E. Steve Putna, Stefan Wurm

Proceedings Volume 7636, 76361D (2010) https://doi.org/10.1117/12.847371

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect inspection, Optical inspection, Particles, Reflectivity, Manufacturing, Deep ultraviolet

Read Abstract +

Proceedings Article | 30 September 2009 Paper

Mask industry assessment: 2009

Greg Hughes, Henry Yun

Proceedings Volume 7488, 748803 (2009) https://doi.org/10.1117/12.832722

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Glasses, Photomask technology, Data processing, Manufacturing, Logic, Inspection

Read Abstract +

Proceedings Article | 27 May 2009 Paper

Sub-30-nm defect removal on EUV substrates

Abbas Rastegar, Sean Eichenlaub, Arun John Kadaksham, Matt House, Brian Cha, Henry Yun

Proceedings Volume 7470, 74700Z (2009) https://doi.org/10.1117/12.835197

KEYWORDS: Particles, Inspection, Extreme ultraviolet, Defect detection, Glasses, Surface finishing, Atomic force microscopy, Chemical mechanical planarization, Optical spheres, Quartz

Read Abstract +

Proceedings Article | 27 May 2009 Paper

Mask industry assessment trend analysis

Greg Hughes, Henry Yun

Proceedings Volume 7470, 747003 (2009) https://doi.org/10.1117/12.835157

KEYWORDS: Photomasks, Binary data, Pellicles, Optical proximity correction, Data processing, Phase shifts, Manufacturing, Microelectronics, Printing, Glasses

Read Abstract +

Proceedings Article | 27 May 2009 Paper

SEMATECH mask program

Henry Yun, Abbas Rastegar, Patrick Kearney, Kevin Orvek

Proceedings Volume 7470, 747005 (2009) https://doi.org/10.1117/12.835796

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Polishing, Surface finishing, Ion beams, Etching, Anisotropic etching, Manufacturing

Read Abstract +

Proceedings Article | 27 May 2009 Paper

Ion beam deposition for defect-free EUVL mask blanks

Patrick Kearney, C. C. Lin, Takashi Sugiyama, Henry Yun, Rajul Randive, Ira Reiss, Alan Hayes, Paul Mirkarimi, Eberhard Spiller

Proceedings Volume 7470, 74700X (2009) https://doi.org/10.1117/12.835195

KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Inspection, Extreme ultraviolet, Deposition processes, Particles, Manufacturing, Ions

Read Abstract +

Proceedings Article | 11 May 2009 Paper

SEMATECH EUVL mask program status

Henry Yun, Frank Goodwin, Sungmin Huh, Kevin Orvek, Brian Cha, Abbas Rastegar, Patrick Kearney

Proceedings Volume 7379, 73790G (2009) https://doi.org/10.1117/12.824257

KEYWORDS: Photomasks, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Lithography, Deposition processes, Defect inspection, Surface roughness, Manufacturing

Read Abstract +

As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been made but a continued collaborative effort will be needed along with timely infrastructure investments to meet these challenging goals.

Proceedings Article | 17 October 2008 Paper

Mask industry assessment: 2008

Greg Hughes, Henry Yun

Proceedings Volume 7122, 712204 (2008) https://doi.org/10.1117/12.802143

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Data conversion, Glasses, Photomask technology, Data processing, Manufacturing, Logic

Read Abstract +

Proceedings Article | 15 March 2006 Paper

Alt- phase-shift mask technology for 65nm logic applications

Kishore Chakravorty, Sven Henrichs, Wei Qiu, Joas Chavez, Yi-Ping Liu, Firoz Ghadiali, Karmen Yung, Nathan Wilcox, Mary Silva, Jian Ma, Ping Qu, Brian Irvine, Henry Yun, Wen-Hao Cheng, Jeff Farnsworth

Proceedings Volume 6154, 61540M (2006) https://doi.org/10.1117/12.654691

KEYWORDS: Quartz, Photomasks, Manufacturing, Etching, Optical lithography, Logic, Critical dimension metrology, Phase shifts, Optical proximity correction, Reticles

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Photomask lifetime issues in ArF lithography

Florence Eschbach, Peter Coon, Barbara Greenebaum, Anurag Mittal, Peter Sanchez, Daniel Tanzil, Grace Ng, Henry Yun, Archita Sengupta

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617078

KEYWORDS: Pellicles, Photomasks, Semiconducting wafers, Reticles, Crystals, Lithography, Critical dimension metrology, Defect detection, Manufacturing, Carbon

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years