Dr. Hongyuan Cai
R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 5 April 2019 Presentation + Paper
Proceedings Volume 10962, 109620P (2019) https://doi.org/10.1117/12.2515156
KEYWORDS: Extreme ultraviolet, Photomasks, Stochastic processes, Lithography, Extreme ultraviolet lithography, 3D modeling, Optical lithography, Manufacturing, EUV optics, Electromagnetism

Proceedings Article | 20 March 2018 Paper
Proceedings Volume 10587, 105870M (2018) https://doi.org/10.1117/12.2299375
KEYWORDS: Photomasks, Lithography, Optical lithography, 3D modeling, Optical proximity correction, Calibration, Photoresist processing, Manufacturing, Computer simulations, Source mask optimization

Proceedings Article | 24 March 2017 Paper
Stephen Jang, Yunqiang Zhang, Tom Cecil, Howard Cai, Amyn Poonawala, Matt St. John
Proceedings Volume 10147, 101471S (2017) https://doi.org/10.1117/12.2258088
KEYWORDS: Optical proximity correction, Lithography, Photomasks, Computational lithography, Lithium, 193nm lithography, Chemical elements, SRAF

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