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Jan Ronsmans
Senior Application Engineer at JSR Micro Materials Innovation
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Publications (1)
Proceedings Article | 15 April 2008 Paper
ArF photoresist formulation influence on elliptical contact shape when using a dipole illumination
E. Tenaglia, J. Ronsmans, D. De Simone, T. Kimura, G. Cotti
Proceedings Volume 6923, 692328 (2008) https://doi.org/10.1117/12.771156
KEYWORDS: Fourier transforms, Polymers, Photoresist materials, Line edge roughness, Absorbance, Electroluminescence, Critical dimension metrology, Resolution enhancement technologies, Photoresist processing, Optical lithography
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