Mr. Jason R. Cantone Profile

Jason R. Cantone

Regional Manager

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 28 March 2017 Presentation + Paper

In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions

Eric Solecky, Allen Rasafar, Jason Cantone, Benjamin Bunday, Alok Vaid, Oliver Patterson, Andrew Stamper, Kevin Wu, Ralf Buengener, Weihao Weng, Xintuo Dai

Proceedings Volume 10145, 101450R (2017) https://doi.org/10.1117/12.2261524

KEYWORDS: Defect inspection, Metrology, Process control, Critical dimension metrology, Inspection, Optical lithography, Semiconducting wafers, Dimensional metrology, Overlay metrology, Manufacturing, Electron beam lithography, Image resolution, Scanning electron microscopy, Image processing

Read Abstract +

Proceedings Article | 18 March 2016 Paper

EUV and optical lithographic pattern shift at the 5nm node

Erik Hosler, Sathish Thiruvengadam, Jason Cantone, Deniz Civay, Uwe Schroeder

Proceedings Volume 9776, 977616 (2016) https://doi.org/10.1117/12.2217532

KEYWORDS: Extreme ultraviolet, Optical lithography, Photomasks, Monte Carlo methods, Extreme ultraviolet lithography, Lithography, Personal protective equipment, Critical dimension metrology, EUV optics, Transistors

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Improving SEM image quality using pixel super resolution technique

Myungjun Lee, Jason Cantone, Ji Xu, Lei Sun, Ryoung-han Kim

Proceedings Volume 9050, 90500U (2014) https://doi.org/10.1117/12.2046426

KEYWORDS: Lawrencium, Scanning electron microscopy, Image resolution, Image quality, Distortion, Super resolution, Semiconducting wafers, Image processing, Metrology, Image enhancement

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Towards electrical testable SOI devices using Directed Self-Assembly for fin formation

Chi-Chun Liu, Cristina Estrada-Raygoza, Hong He, Michael Cicoria, Vinayak Rastogi, Nihar Mohanty, Hsinyu Tsai, Anthony Schepis, Kafai Lai, Robin Chao, Derrick Liu, Michael Guillorn, Jason Cantone, Sylvie Mignot, Ryoung-Han Kim, Joy Cheng, Melia Tjio, Akiteru Ko, David Hetzer, Mark Somervell, Matthew Colburn

Proceedings Volume 9049, 904909 (2014) https://doi.org/10.1117/12.2046462

KEYWORDS: Etching, Silicon, Polymethylmethacrylate, Semiconducting wafers, Scatterometry, Image processing, 3D modeling, Line edge roughness, Defect detection, Directed self assembly

Read Abstract +

Proceedings Article | 20 March 2012 Paper

Assessment of negative tone development challenges

Sohan Mehta, Yongan Xu, Guillaume Landie, Vikrant Chauhan, Sean Burns, Peggy Lawson, Bassem Hamieh, Jerome Wandell, Martin Glodde, Yu Yang Sun, Mark Kelling, Alan Thomas, Jeong Soo Kim, James Chen, Hirokazu Kato, Chiahsun Tseng, Chiew-Seng Koay, Yoshinori Matsui, Martin Burkhardt, Yunpeng Yin, David Horak, Shyng-Tsong Chen, Yann Mignot, Yannick Loquet, Matthew Colburn, John Arnold, Terry Spooner, Lior Huli, Dave Hetzer, Jason Cantone, Shinichiro Kawakami, Shannon Dunn

Proceedings Volume 8325, 832506 (2012) https://doi.org/10.1117/12.917560

KEYWORDS: Semiconducting wafers, Polymers, Optical proximity correction, Reactive ion etching, Etching, Scanning electron microscopy, Neodymium, Photoresist developing, Image processing, Roads

Read Abstract +

Proceedings Article | 16 April 2011 Paper

Negative-tone imaging (NTI) at the 22nm node: process and material development

Jason Cantone, Karen Petrillo, Yongan Xu, Guillaume Landie, Shinichiro Kawakami, Shannon Dunn, Matt Colburn

Proceedings Volume 7972, 79720M (2011) https://doi.org/10.1117/12.879719

KEYWORDS: Image processing, Photoresist developing, Semiconducting wafers, Photoresist materials, Standards development, Scanning electron microscopy, Lithography, Thin film coatings, Reticles, Materials processing

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Towards manufacturing of advanced logic devices by double-patterning

Chiew-seng Koay, Scott Halle, Steven Holmes, Karen Petrillo, Matthew Colburn, Youri van Dommelen, Aiqin Jiang, Michael Crouse, Shannon Dunn, David Hetzer, Shinichiro Kawakami, Jason Cantone, Lior Huli, Martin Rodgers, Brian Martinick

Proceedings Volume 7973, 79730F (2011) https://doi.org/10.1117/12.879618

KEYWORDS: Semiconducting wafers, Overlay metrology, Optical alignment, Silicon, Scanners, Scanning electron microscopy, Critical dimension metrology, Data modeling, Manufacturing, Double patterning technology

Read Abstract +

Proceedings Article | 26 March 2010 Paper

Controlling 2D aspect ratio of elliptical contact level interconnects utilizing spin-on and reactive ion etch critical dimension shrink for the 22-nm node

Andrew Metz, Shannon Dunn, Dave Hetzer, Jason Cantone, Shinichiro Kawakami, Tom Winter, Karen Petrillo, Dave Horak, Susan Fan, Matthew Colburn

Proceedings Volume 7639, 76392Z (2010) https://doi.org/10.1117/12.846625

KEYWORDS: Reactive ion etching, Critical dimension metrology, Etching, Chemical reactions, Lithography, Ions, Cadmium, Double patterning technology, Chemistry, Scanning electron microscopy

Read Abstract +

Proceedings Article | 4 March 2010 Paper

Evaluation of double-patterning techniques for advanced logic nodes

Chiew-Seng Koay, Steven Holmes, Karen Petrillo, Matthew Colburn, Sean Burns, Shannon Dunn, Jason Cantone, David Hetzer, Shinichiro Kawakami, Youri van Dommelen, Aiqin Jiang, Michael Many, Robert Routh, Lior Huli, Brian Martinick, Martin Rodgers, Hideyuki Tomizawa, Sumanth Kini

Proceedings Volume 7640, 764009 (2010) https://doi.org/10.1117/12.846769

KEYWORDS: Double patterning technology, Semiconducting wafers, Scanners, Overlay metrology, Photoresist processing, Chemical reactions, Semiconductors, Thin film coatings, Scanning electron microscopy, Logic

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Utilization of spin-on and reactive ion etch critical dimension shrink with double patterning for 32 nm and beyond contact level interconnects

Karen Petrillo, Dave Horak, Susan Fan, Erin McLellan, Matt Colburn, Andrew Metz, Shannon Dunn, Dave Hetzer, Jason Cantone, Kenichi Ueda, Tom Winter, Vaidyanathan Balasubramaniam, Cherry Tang, Mark Slezak

Proceedings Volume 7273, 72731A (2009) https://doi.org/10.1117/12.814260

KEYWORDS: Reactive ion etching, Etching, Critical dimension metrology, Double patterning technology, Lithography, Ions, Semiconducting wafers, Cadmium, Scanners, Solar thermal energy

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Defectivity issues in topcoat-free photoresists

Karen Petrillo, Rick Johnson, Will Conley, Jason Cantone, Dave Hetzer, Shannon Dunn, Tom Winter, Youri van Dommelen, Aiqin Jiang

Proceedings Volume 7273, 72732C (2009) https://doi.org/10.1117/12.828291

KEYWORDS: Photoresist materials, Semiconducting wafers, Lithography, Diffractive optical elements, Scanning electron microscopy, Photoresist developing, Particles, Standards development, Immersion lithography, Manufacturing

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Engine for characterization of defects, overlay, and critical dimension control for double exposure processes for advanced logic nodes

Steven Holmes, Chiew-Seng Koay, Karen Petrillo, Kuang-Jung Chen, Matthew Colburn, Jason Cantone, Kenichi Ueda, Andrew Metz, Shannon Dunn, Youri van Dommelen, Michael Crouse, Judy Galloway, Emil Schmitt-Weaver, Aiquin Jiang, Robert Routh, Cherry Tang, Mark Slezak, Sumanth Kini, Tony DiBiase

Proceedings Volume 7273, 727305 (2009) https://doi.org/10.1117/12.828483

KEYWORDS: Overlay metrology, Semiconducting wafers, Double patterning technology, Lithography, Semiconductors, Defect inspection, Scanning electron microscopy, Logic, Polymers, Photomasks

Read Abstract +

Showing 5 of 12 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years