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Jeonghwan Kim
at SK Materials Co Ltd
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Author
Publications (2)
Proceedings Article | 10 April 2024 Poster
Mask shift double exposure method in arf immersion lithography
Jungchul Song, Gyu-Won Han, Jeonghwan Kim, Ga-Won Lee
Proceedings Volume PC12953, PC129530X (2024) https://doi.org/10.1117/12.3010697
KEYWORDS: Immersion lithography, Scanners, Etching, Spin on carbon materials, Semiconductors, Semiconducting wafers, Optical lithography, Lithography, Light sources, Dry etching
SPIE Journal Paper | 1 February 2024
19-nm critical dimension process using mask shift double exposure in ArF immersion
Jungchul Song, Gyu-Won Han, Jeonghwan Kim, Gawon Lee
JM3, Vol. 23, Issue 01, 014801, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.014801
KEYWORDS: Critical dimension metrology, Double patterning technology, Optical lithography, Semiconducting wafers, Line width roughness, Scanners, Photoacid generators, Etching, Light sources, Diffractive optical elements
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