Mr. Jinhong Kim Profile

Jinhong Kim

at Univ of Illinois

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 17 March 2023 Presentation

Microplasma exposure as a novel therapeutic treatment for otitis media demonstrated in a pre-clinical chinchilla model

Guillermo Monroy, Jinhong Kim, Alexander Ho, Andrey Mironov, Farzana Zaki, Darold Spillman, Gabrielle Choo-Kang, Jungeun Won, Peter Sun, Edita Aksamitiene, Marina Marjanovic, Eric Chaney, Thanh Huong Nguyen, J. Gary Eden, Stephen Boppart

Proceedings Volume PC12358, PC1235809 (2023) https://doi.org/10.1117/12.2648469

KEYWORDS: Ear, Chemical mechanical planarization, Optical coherence tomography, In vitro testing, Injuries, Animal model studies, Tissues, Resistance, Medicine, Instrument modeling

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Proceedings Article | 1 August 2021 Presentation

Eco-friendly 3D micromachining of polymers by 172 nm photoablation for optical and microfluidics applications

Andrey Mironov, Sehyun Park, Thomas Reboli, Jinhong Kim, Dane Sievers, Sung-Jin Park, James Eden

Proceedings Volume 11801, 1180103 (2021) https://doi.org/10.1117/12.2594868

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Proceedings Article | 5 March 2021 Presentation

Fabrication of optical components and micro- and nanofluidic devices in polymers by 172 nm direct photoablation

Andrey Mironov, Jinhong Kim, Austin Steinforth, Sehyun Park, Dane Sievers, Sung-Jin Park, James Eden

Proceedings Volume 11696, 116960K (2021) https://doi.org/10.1117/12.2583254

KEYWORDS: Polymers, Optical components, Vacuum ultraviolet, Polymethylmethacrylate, Photosensitive materials, Lamps, Excimers, Excimer lasers, Clean room processes

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Proceedings Article | 10 March 2020 Presentation

172 nm patterning of optical components on polymers (Conference Presentation)

Andrey Mironov, Dane Sievers, Austin Steinforth, Jinhong Kim, Sung-Jin Park, James Eden

Proceedings Volume 11292, 112920T (2020) https://doi.org/10.1117/12.2546426

KEYWORDS: Polymers, Optical components, Optical lithography, Lamps, Vacuum ultraviolet, Excimer lasers, Cornea, Optical microcavities, Plasmas, Molecules

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Proceedings Article | 9 September 2019 Presentation

Photo-ablation lithographic technique at 172 nm based upon flat excimer lamps (Conference Presentation)

Andrey Mironov, Dane Sievers, Jinhong Kim, Sung-Jin Park, James Eden

Proceedings Volume 11086, 110860M (2019) https://doi.org/10.1117/12.2529538

KEYWORDS: Lamps, Lithography, Excimers, Photoresist materials, Photoresist developing, Electron beam lithography, Polymers, Photomasks, Electron beams, Polymethylmethacrylate

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